Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
申请人:EASTMAN KODAK COMPANY
公开号:EP0756205A2
公开(公告)日:1997-01-29
In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate,
(a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure
wherein:
n is 2 or greater;
x is selected from the group consisting of H, CH3, Br and Cl; and
Z is selected from the group consisting of nil, O, S, CH2, C=O, SO, SO2, CH-CH3, CH3-C-CH3, CF3-C-CF3, CH3-C-CH2CH3,
(b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed;
(c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern;
(d) removing the thin etch-stop mask; and
(e) thermally reflowing the patterned transparent layer to form the transparent lenslets.
在一种用于形成透镜片的方法中,透镜片收集光线并将其聚焦到电子成像仪的感光元件上,包括在基板上或基板上的层上提供透明的透镜片形成层、
(a) 在衬底上或衬底上的层上提供透明聚酯小透镜形成层,该聚酯含有部分具有以下结构的重复单元
其中
n 为 2 或更大;
x 选自由 H、CH3、Br 和 Cl 组成的组;以及
Z 选自由 n、O、S、CH2、C=O、SO、SO2、CH-CH3、CH3-C-CH3、CF3-C-CF3、CH3-C-CH2CH3 组成的组、
(b) 在透明小透镜形成层上形成薄蚀刻阻挡层,并将蚀刻阻挡层图案化以形成掩模,使图案与要形成的小透镜相对应;
(c) 根据图案对透明小透镜形成层进行各向异性等离子蚀刻;
(d) 去除薄蚀刻停止掩膜;以及
(e) 对图案化透明层进行热回流,以形成透明小透镜。