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benzene-1,2,4-tricarboxylic acid-1,4-dimethyl ester | 185050-61-7

中文名称
——
中文别名
——
英文名称
benzene-1,2,4-tricarboxylic acid-1,4-dimethyl ester
英文别名
Benzol-1,2,4-tricarbonsaeure-1,4-dimethylester;Trimellitsaeure-dimethylester-(1.4);1,4-Dicarbomethoxy-3-carboxy benzene;2,5-bis(methoxycarbonyl)benzoic acid
benzene-1,2,4-tricarboxylic acid-1,4-dimethyl ester化学式
CAS
185050-61-7
化学式
C11H10O6
mdl
——
分子量
238.197
InChiKey
GKKUVAJSHWPSBO-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    414.9±35.0 °C(Predicted)
  • 密度:
    1.340±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1
  • 重原子数:
    17
  • 可旋转键数:
    5
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.18
  • 拓扑面积:
    89.9
  • 氢给体数:
    1
  • 氢受体数:
    6

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • [EN] BENZENE, PYRIDINE, NAPHTALENE OR BENZOPHENONE DERIVATIVES AS INHIBITORS OF SQUALENE SYNTHETASE AND PROTEIN FARNESYLTRANSFERASE<br/>[FR] DERIVES DE BENZENE, PYRIDINE, NAPHTALENE OU BENZOPHENONE UTILISES COMME INHIBITEURS DE LA SQUALENE SYNTHETASE ET DE LA PROTEINE FARNESYLTRANSFERASE
    申请人:ABBOTT LABORATORIES
    公开号:WO1996034851A1
    公开(公告)日:1996-11-07
    (EN) The present invention provides a compound of formula (I), (II), (III) or (IV), processes for the preparation of the compounds of the invention, intermediates useful in these processes, a pharmaceutical composition, and methods of using the compounds of the invention.(FR) La présente invention se rapporte à des composés de la formule (I), (II), (III) ou (IV), aux procédés de préparation de ces composés, aux intermédiaires utilisés dans ces procédés, à une composition pharmaceutique et aux procédés d'utilisation de ces composés.
    该发明提供了公式(I),(II),(III)或(IV)的化合物,制备该发明化合物的方法,这些方法中有用的中间体,制药组合物以及使用该发明化合物的方法。
  • Thermoplastic polyamideimide copolymers and method of preparation
    申请人:TORAY INDUSTRIES, INC.
    公开号:EP0017422A1
    公开(公告)日:1980-10-15
    Thermoplastic polyamideimide copolymers are provided which are excellent in both heat stability and melt viscosity characteristics at a temperature of from about 300°C to about 400°C. The copolymers of the invention comprise Units A of the formula in an amount of about 50 mole %, Units B of the formula in an amount of about 15-48 mole % and Units C of the formula in an amount of about 35-2 mole %, wherein Z is a trivalent aromatic group having two of its three carbonyl groups attached to adjacent carbon atoms, a is 0 or 1, b is 0,1,2,3 or 4, R1 is alkyl (C1-4), R2 is selected from alkyl (C1-4), halo and nitro, c is an integer from 1 to 25 and X is chosen from - SO2 -CO- or -C(CH3)2-. The copolymers may be made by reacting diamines containing the Units B and C respectively, e.g. I and II, with trimellitic acid (or another aromatic tribasic carboxylic acid with two carboxyl groups attached to adjacent carbon atoms) in an organic polar solvent using a dehydrating catalyst - or alternatively the diamines may be reacted with the acid anhydride acid chloride using a hydrochloride scavenger, subsequently closing the ring of the polyamide-amic acid thus formed.
    本发明提供的热塑性聚酰胺酰亚胺共聚物在约 300°C 至约 400°C 的温度条件下,热稳定性和熔融粘度特性都非常出色。 本发明的共聚物包含式中的单元 A,其含量约为 50 摩尔%;式中的单元 B,其含量约为 50 摩尔%。 约 50 摩尔%,式中单元 B 含量约为 15-48 摩尔%,以及式中的单元 C 其中 Z 是三价芳香基团,其三个羰基中的两个与相邻碳原子相连;a 是 0 或 1;b 是 0、1、2、3 或 4;R1 是烷基(C1-4);R2 选自烷基(C1-4)、卤代和硝基;c 是 1 至 25 的整数;X 选自-SO2-CO-或-C(CH3)2-。共聚物的制造方法是:使用脱水催化剂,在有机极性溶剂中,将分别含有单元 B 和单元 C 的二胺(如 I 和 II)与偏苯三酸(或另一种在相邻碳原子上连接有两个羧基的芳香族三元羧酸)反应,或者使用盐酸盐清除剂,将二胺与酸酐酰氯反应,然后封闭由此形成的聚酰胺-氨基甲酸酯环。
  • PASTE COMPOSITION, AND PROTECTIVE FILM AND SEMICONDUCTOR DEVICE BOTH OBTAINED WITH THE SAME
    申请人:Hitachi Chemical Company, Ltd.
    公开号:EP1114845A1
    公开(公告)日:2001-07-11
    A paste composition which comprises as essential ingredients (A) a thermoplastic resin, (B) an epoxy resin, (C) a coupling agent, (D) a powdery inorganic filler, (E) a powder having rubber elasticity and (F) an organic solvent and which, when applied and dried, gives a coating film having a void content of 3 % by volume or higher and a water vapor permeability as measured at 40°C and 90 %RH of 500 g/m2·24h or less; a protective film which is formed by applying the paste composition to a surface of a semiconductor part and drying it and has a void content of 3 % by volume or higher and a water vapor permeability as measured at 40°C and 90 %RH of 500 g/m2·24h or less; and a semiconductor device having the protective film.
    一种糊状组合物,其基本成分包括:(A) 热塑性树脂;(B) 环氧树脂;(C) 偶联剂;(D) 粉末状无机填料;(E) 具有橡胶弹性的粉末;(F) 有机溶剂;该糊状组合物在涂抹和干燥后可形成一层涂膜,其空隙率为 3% 或更高,在 40°C 和 90%RH 条件下测得的水蒸气透过率为 500 g/m2-24h 或更低;一种保护膜,它是通过在半导体部件表面涂抹浆糊组合物并将其干燥而形成的,其空隙率为 3% 或更高,在 40°C 和 90%RH 条件下测量的水蒸气渗透率为 500 g/m2-24h 或更低;以及一种具有该保护膜的半导体器件。
  • Adhesive film, lead frame with adhesive film, and semiconductor device using same
    申请人:Matsuura Hidekazu
    公开号:US20050255278A1
    公开(公告)日:2005-11-17
    The present invention provides an adhesive film that combines low temperature adhesion with favorable wire bonding characteristics. The adhesive film used for bonding a semiconductor element to a target adherend comprises an adhesive layer formed on one surface, or both surfaces, of a heat resistant film, the adhesive layer comprises a resin A and a resin B, a glass transition temperature of the resin A is lower than a glass transition temperature of the resin B, and the adhesive layer has a sea-island structure, in which the resin A forms the sea, and the resin B forms the islands.
  • THERMOPLASTIC RESIN COMPOSITION FOR SEMICONDUCTOR, ADHESION FILM, LEAD FRAME, AND SEMICONDUCTOR DEVICE USING THE SAME, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE
    申请人:Tateoka Kiyohide
    公开号:US20090091012A1
    公开(公告)日:2009-04-09
    The object of the present invention is to provide an adhesion film for semiconductor that is capable of bonding a semiconductor chip to a lead frame tightly at an adhesion temperature lower than that of the adhesion film of a traditional polyimide resin without generation of voids and that can also be used for protection of lead frame-exposed area, a thermoplastic resin composition for semiconductor for use in the adhesive agent layer therein, and a lead frame having the adhesive film and a semiconductor device; and, to achieve the object, the present invention provides a thermoplastic resin composition for semiconductor, comprising a thermoplastic resin obtained in reaction of an amine component containing an aromatic diamine mixture (A) containing 1,3-bis(3-aminophenoxy)benzene, 3-(3′-(3″-aminophenoxy)phenyl)amino-1-(3′-(3″-aminophenoxy)phenoxy)benzene and 3,3′-bis(3″-aminophenoxy)diphenylether, and an acid component (C), an adhesion film for semiconductor using the same, a lead frame having the adhesion film and a semiconductor device using the same.
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