N-(o-Hydroxyphenyl)-methacrylsaeureamid | 3331-55-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-(o-Hydroxyphenyl)-methacrylsaeureamid
• 英文别名: o-(Methacryloylamino)phenol；2-Hydroxy-phenyl-methacrylamid；N-(2-hydroxy-phenyl)-2-methyl-acrylamide；N-(2-hydroxyphenyl)methacrylamide；N-(2-hydroxyphenyl)-2-methylprop-2-enamide
• CAS: 3331-55-3
• 化学式: C₁₀H₁₁NO₂
• 分子量: 177.203
• InChiKey: ICWPRFNZEBFLPT-UHFFFAOYSA-N

物化性质

• 熔点：
  106-108 °C
• 沸点：
  356.5±34.0 °C(Predicted)
• 密度：
  1.190±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  49.3
• 氢给体数：
  2
• 氢受体数：
  2

安全信息

• 海关编码：
  2924299090

反应信息

• 作为反应物：
  描述：

  N-(o-Hydroxyphenyl)-methacrylsaeureamid 在 phosphorus pentoxide 作用下， 生成 2-(1-丙烯-2-基)苯并[d]噁唑
  参考文献：
  名称：

  Korshak,V.V. et al., Journal of Organic Chemistry USSR (English Translation), 1976, vol. 12, p. 2196 - 2197

  摘要：

  DOI：
• 作为产物：
  描述：

  甲基丙烯酸酐 、 2-氨基苯酚 以 丙酮 为溶剂， 生成 N-(o-Hydroxyphenyl)-methacrylsaeureamid
  参考文献：
  名称：

  Panarin,E.F.; Berov,M.B., Journal of Organic Chemistry USSR (English Translation), 1968, vol. 4, p. 802 - 803

  摘要：

  DOI：

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
  申请人：Maeda Katsumi

  公开号：US20090068587A1

  公开（公告）日：2009-03-12

  The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R 1 represents a hydrogen atom or a methyl group; R 2 represents an acid-decomposable group; and R 3 to R 6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.

  本发明涉及一种由通式（1）表示的新型（甲基）丙烯酰胺化合物，该化合物的（共）聚合物，以及由聚合物和光酸发生剂组成的化学增感光敏树脂组合物。在该式中，R1代表氢原子或甲基基团；R2代表可分解酸基团；R3至R6独立地代表氢原子、卤素原子或具有1至4个碳原子的烷基基团。
• Cured film-forming composition
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US10669376B2

  公开（公告）日：2020-06-02

  Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.)

  提供的是一种治愈的成膜组合物，由该组合物形成的图像形成底层膜表现出高液体排斥性（亲疏性），即使暴露于低量紫外辐射下，底层膜的亲疏性和液体排斥性也可以轻松改变；以及使用该组合物获得的治愈膜。该治愈成膜树脂组合物的特点是包含：作为组分（A）的具有来自第一单体的结构单元的聚合物，该单体的结构式为（1）；除组分（A）外的另一种聚合物，其相对于聚合物总重量的含氟量低于组分（A），作为组分（B）；作为组分（C）的光酸发生剂；和溶剂。（在公式中，R1表示氢或甲基基团，R2表示能够与R2键合的氧原子一起脱落的含氟基团。）
• Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
  申请人：——

  公开号：US20030219673A1

  公开（公告）日：2003-11-27

  An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). 1 wherein R 1 is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar 1 is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R 2 , R 3 and R 4 are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R 5 and R 6 are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.

  一种酸发生剂，用于成像光敏元素，所选化合物的公式为（I），（II）和（III）。 其中，R1选自未取代和取代的烃基或芳基组； 其中，X选自氧、硫和硒组； 其中，Y选自硫、硒和碲组； 其中，Ar1选自未取代和取代的芳基组； 其中，R2、R3和R4分别选自未取代和取代的烃基或芳基组，或其中任意两个结合形成环状结构； 其中，R5和R6分别选自未取代和取代的烃基或芳基组，或结合形成环状结构。
• Radiation-sensitive mixture containing novel polymers embodying units
  申请人：Hoechst Aktiengesellschaft

  公开号：US05326840A1

  公开（公告）日：1994-07-05

  A radiation-sensitive mixture is disclosed that contains a polymeric binder having acid-cleavable side groups and a compound which forms a strong acid on irradiation. Novel amides of .alpha.,.beta.-unsaturated carboxylic acids with which the polymers used as binders are synthesized are also disclosed. A positive- or negative-working radiation-sensitive recording material comprising a base and a layer of the radiation-sensitive mixture according to the invention is also disclosed.

  本发明公开了一种辐射敏感混合物，其包含具有酸可解侧基的聚合物粘合剂和在辐射下形成强酸的化合物。本发明还公开了合成聚合物粘合剂所使用的α，β-不饱和羧酸的新型酰胺。本发明还公开了一种基底和根据本发明的辐射敏感混合物的层构成的正向或负向作用的辐射敏感记录材料。