Advanced polishing pads having compositional gradients by use of an additive manufacturing process
申请人:Applied Materials, Inc.
公开号:US10399201B2
公开(公告)日:2019-09-03
Embodiments herein relate to advanced polishing pads with tunable chemical, material and structural properties, and manufacturing methods related thereto. According to one or more embodiments herein, a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments herein thus may provide an advanced polishing pad having discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments herein further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
本实施例涉及具有可调化学、材料和结构特性的先进抛光垫及其相关制造方法。根据本文的一个或多个实施例,具有改进性能的抛光垫可通过增材制造工艺(如三维(3D)打印工艺)生产。因此,本发明的实施例可以提供一种具有离散特征和几何形状的高级抛光垫,该抛光垫由至少两种不同的材料形成,这些材料包括功能聚合物、功能低聚物、活性稀释剂、添加聚合物前体化合物、催化剂和固化剂。例如,高级抛光垫可由多个聚合物层通过至少一种聚合物前体组合物的自动顺序沉积以及至少一个固化步骤形成,其中每个层可代表至少一种聚合物组合物和/或不同组合物的区域。本发明的实施例进一步提供了一种抛光垫,其聚合物层可以是相互渗透的聚合物网络。