2-isopropyl-anthrone | 861607-27-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 2-isopropyl-anthrone
• 英文别名: 9-Oxo-2-isopropyl-9.10-dihydro-anthracen；2-Isopropyl-anthron；2-propan-2-yl-10H-anthracen-9-one
• CAS: 861607-27-4
• 化学式: C₁₇H₁₆O
• 分子量: 236.313
• InChiKey: TXKNWFXUEILQKY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.24
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-isopropyl-anthrone 在 ammonium hydroxide 、 锌 作用下， 生成 2-异丙基蒽
  参考文献：
  名称：

  Waldmann; Marmorstein, Chemische Berichte, 1937, vol. 70, p. 106

  摘要：

  DOI：
• 作为产物：
  描述：

  2-[[4-(1-甲基乙基)苯基]甲基]苯甲酸 在 zinc(II) chloride 作用下， 生成 2-isopropyl-anthrone
  参考文献：
  名称：

  Scholl; Potschiwauscheg; Lenko, Monatshefte fur Chemie, 1911, vol. 32, p. 700

  摘要：

  DOI：

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140248556A1

  公开（公告）日：2014-09-04

  A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.
• US9128376B2
  申请人：——

  公开号：US9128376B2

  公开（公告）日：2015-09-08
• US9637565B2
  申请人：——

  公开号：US9637565B2

  公开（公告）日：2017-05-02
• [EN] PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RAYONNEMENTS, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2013081168A1

  公开（公告）日：2013-06-06

  A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.
• Scholl; Potschiwauscheg; Lenko, Monatshefte fur Chemie, 1911, vol. 32, p. 700
  作者：Scholl、Potschiwauscheg、Lenko

  DOI：——

  日期：——