申请人:Hoffmann-La Roche Inc.
公开号:US04436662A1
公开(公告)日:1984-03-13
The present invention relates to compounds of the formula ##STR1## wherein R.sub.1 and R.sub.3 are selected from the group consisting of hydrogen, lower alkyl, hydroxy, lower alkoxy or acyloxy and R.sub.2 and R.sub.4 are hydrogen or R.sub.1 and R.sub.2 and/or R.sub.3 and R.sub.4 taken together are oxo groups with the proviso that at least one oxo group is present; R is selected from the group consisting of hydrogen, lower alkyl, C.sub.2 to C.sub.7 carboxylic acids and the esters and amides thereof, hydroxy C.sub.2 to C.sub.7 alkyl and amino C.sub.2 to C.sub.7 alkyl or mono- or di-lower alkyl amino C.sub.2 to C.sub.7 alkyl; R.sub.5 is halogen or hydrogen; and R.sub.6 is halogen with the proviso that when R.sub.1 or R.sub.3 is hydroxy, lower alkoxy or acyloxy, then R is lower alkyl or hydrogen and the N-oxides and the pharmaceutically acceptable salts thereof.
本发明涉及以下结构的化合物 ##STR1## 其中R.sub.1和R.sub.3选自羟基、较低烷基、羟基、较低烷氧基或酰氧基的群组,R.sub.2和R.sub.4是氢或R.sub.1和R.sub.2和/或R.sub.3和R.sub.4一起是氧代基,但至少有一个氧代基存在;R选自氢、较低烷基、C.sub.2至C.sub.7羧酸及其酯和酰胺、羟基C.sub.2至C.sub.7烷基和氨基C.sub.2至C.sub.7烷基或单烷基或双烷基氨基C.sub.2至C.sub.7烷基的群组;R.sub.5是卤素或氢;R.sub.6是卤素,但当R.sub.1或R.sub.3为羟基、较低烷氧基或酰氧基时,R为较低烷基或氢,以及其N-氧化物和药用盐。