Ester compounds and their preparation, polymers, resist compositions and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US07902385B2
公开(公告)日:2011-03-08
Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic hydrocarbon ring, R3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.
具有式(1)至(4)的新型酯化合物,其中A1是具有碳-碳双键的可聚合官能团,A2是氧,亚甲基或乙烯基,R1是单价的碳氢基团,R2是H或单价的碳氢基团,任何一对R1和/或R2都可以形成脂肪族碳氢环,R3是单价的碳氢基团,n为0至6,这些化合物可以聚合成聚合物。以这些聚合物为基础树脂的抗蚀剂组合物具有热稳定性和对高能辐射的敏感性,具有优异的敏感性和分辨率,并适用于电子束或深紫外线微图案化。