The invention relates to the use of a metal complex, which has at least one ligand of the formula R
1
—N
3
—R
2
, wherein R
1
and R
2
are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.
该发明涉及使用至少具有一个
配体的
金属配合物,该
配体具有R1—N3—R2的结构式,其中R1和R2是碳氢基团,用于从气相沉积
金属或
金属化合物。该发明还涉及从
金属配合物沉积
金属的方法,以及
金属配合物、取代
三氮烯化合物的方法和生产方法。