Transannular bond formation between the amino and the sulfonio groups in 6,7-dihydro-6-methyl-5H-dibenzo[b,g][1,5]thiazocinium salts. The first example of a sulfurane with an apical alkyl group
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20210247694A1
公开(公告)日:2021-08-12
A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.
Transannular bond formation between the amino and the sulfonio groups in 6,7-dihydro-6-methyl-5H-dibenzo[b,g][1,5]thiazocinium salts. The first example of a sulfurane with an apical alkyl group