A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
一种正向光刻胶组合物,包括(A)一种化合物,通过受到光辐射或辐射而产生特定磺
酰亚胺化合物,以及(B)一种
树脂,具有一种基团,通过酸的作用分解以增加组合物在碱性显影剂中的溶解度。该光刻胶组合物具有改善的分辨率和改善的工艺容差,如曝光余量和焦深,适用于使用短波长光源的光刻技术和正向
化学增强型光刻胶的超细加工。