There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
已披露磺酸前体组合物,以及在例如光刻中使用这些组合物的方法。还披露了其他实施方式。
STABILIZED ACID AMPLIFIERS
申请人:Brainard Robert L.
公开号:US20140193752A1
公开(公告)日:2014-07-10
There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
公开了磺酸前体组合物,以及使用这些组合物进行光刻等方法。还公开了其他实施例。
Chemical amplification in self-strengthening materials
申请人:The Board of Trustees of the University of Illinois
公开号:US10377879B2
公开(公告)日:2019-08-13
A self-strengthening material is provided, the material comprising a polymer matrix having a plurality of chemical amplifiers dispersed throughout the polymer matrix and a plurality of triggerable reservoirs, the triggerable reservoirs capable of releasing at least one activator of the plurality of chemical amplifiers, wherein the plurality of chemical amplifiers reacts with the at least one activator to produce additional activators capable of changing the mechanical properties of the polymer matrix, and thus strengthening the material.
作者:Seth Kruger、Sri Revuru、Craig Higgins、Sarah Gibbons、Daniel A. Freedman、Wang Yueh、Todd R. Younkin、Robert L. Brainard
DOI:10.1021/ja901448d
日期:2009.7.29
Five new compounds were synthesized for use as acid amplifiers in EUV (13.5 nm) photoresists. Four compounds act as acid amplifiers and decompose by autocatatytic kinetics to generate fluorinated sulfonic acids, essential for the simultaneous improvement of resolution, sensitivity, and line edge roughness (LER) in EUV photoresists. The decomposition rates were studied using F-19 NMR in the presence and absence of 1.2 equiv of tri-tert-butylpyridine. Three acid amplifiers decomposed 490, 1360, and 1430 times faster without base than with base. Preliminary lithographic evaluations show that cis-1-methyt-2-(4-(trifluoromethyl)phenylsulfonyloxy)cyclohexyl acetate simultaneously improves the resolution, LER, and sensitivity of an EUV photoresist.
CHEMICAL AMPLIFICATION IN SELF-STRENGTHENING MATERIALS
申请人:The Board of Trustees of the University of Illinois
公开号:US20180105678A1
公开(公告)日:2018-04-19
A self-strengthening material is provided, the material comprising a polymer matrix having a plurality of chemical amplifiers dispersed throughout the polymer matrix and a plurality of triggerable reservoirs, the triggerable reservoirs capable of releasing at least one activator of the plurality of chemical amplifiers, wherein the plurality of chemical amplifiers reacts with the at least one activator to produce additional activators capable of changing the mechanical properties of the polymer matrix, and thus strengthening the material.