申请人:Ciba Geigy Corporation
公开号:US04560643A1
公开(公告)日:1985-12-24
The use of photosensitive compositions of matter for electroless deposition of metals, containing (a) 0.1 to 20 percent by weight of a compound of the formula I ##STR1## in which Y and R.sub.1 to R.sub.6 are as defined in patent claim 1, (b) 70 to 99.8% by weight of a polymer with H donor groups and an average molecular weight of at least 2,000 Daltons, or of a polymer mixture of a polymer component with H donor groups and an average molecular weight of at least 2,000 Daltons and a second polymer component with an average molecular weight of at least 3,000 Daltons, and (c) 0.1 to 10% by weight of one or more salts of a metal of group Ib or VIII of the periodic table. Images, in particular electrically conductive coatings or patterns, can be produced with the above compositions of matter by exposing the compositions of matter to light and then depositing a metal on the zero-valent, non-conductive metal nuclei thereby formed.
使用光敏化合物进行无电解金属沉积的方法,其包含(a)化学式I的化合物,其重量百分比为0.1至20%,其中Y和R.sub.1至R.sub.6在专利权要求1中定义,(b)重量百分比为70至99.8%的带有H供体基团的聚合物,平均分子量至少为2,000道尔顿,或者由具有H供体基团且平均分子量至少为2,000道尔顿的聚合物组分和平均分子量至少为3,000道尔顿的第二聚合物组分的聚合物混合物组成,以及(c)重量百分比为0.1至10%的一种或多种Ib或VIII族金属的盐。可以通过将上述物质曝光于光线并在形成的零价、非导电金属核上沉积金属来制备图像,特别是电导涂层或图案。