申请人:——
公开号:US20040171855A1
公开(公告)日:2004-09-02
A metallocene compound of formula (I): wherein M is zirconium, titanium and hafnium; X is a hydrogen atom, a halogen atom or a hydrocarbon radical; R
1
is a linear C
1
-C
20
-alkyl radical; R
2
is a hydrogen atom or hydrocarbon R
3
, R
4
, R
5
, R
6
, R
7
, and R
8
, are hydrogen atoms or hydrocarbon radicals, A is a sulphur (S) atom or an oxygen (O) atom; Q is a radical of formula (II), (III) or (IV) being bonded to the indenyl at the position indicated by the symbol *; (II), (III), (IV) wherein T
1
is a sulphur atom, an oxygen (O) atom or a NR; R
9
, R
10
and R
11
are hydrogen atoms or hydrocarbon radicals; T
2
, T
3
, T
4
, T
5
, and T
6
are carbon atoms (C) or nitrogen atoms (N); m
1
, m
2
, m
3
, m
4
and m
5
are 0 or 1; R
12
, R
13
, R
14
, R
15
and R
16
are hydrogen atoms or hydrocarbon radicals with the provisos that at least one of R
12
, R
13
, R
14
, R
15
and R
16
is different from hydrogen atoms, two of T
2
, T
3
, T
4
, T
5
and T
6
are nitrogen atoms.
化合物的配位基为(I)式,其中M为锆、钛和铪;X为氢原子、卤素原子或烃基;R1为线性C1-C20烷基;R2为氢原子或烃基R3、R4、R5、R6、R7和R8为氢原子或烃基,A为硫(S)原子或氧(O)原子;Q为公式(II)、(III)或(IV)的基团,与印戊烯在符号*所示的位置结合;其中(II)、(III)、(IV)中T1为硫原子、氧(O)原子或NR;R9、R10和R11为氢原子或烃基;T2、T3、T4、T5和T6为碳原子(C)或氮原子(N);m1、m2、m3、m4和m5为0或1;R12、R13、R14、R15和R16为氢原子或烃基,但至少其中一个不是氢原子,T2、T3、T4、T5和T6中有两个是氮原子。