3,6,12,15-四氧杂-9-氮杂十七烷-1,17-二醇,9-十二烷基- | 56975-19-0

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 3,6,12,15-四氧杂-9-氮杂十七烷-1,17-二醇,9-十二烷基-
• 英文名称: 2-{2-[2-(Dodecyl-{2-[2-(2-hydroxy-ethoxy)-ethoxy]-ethyl}-amino)-ethoxy]-ethoxy}-ethanol
• 英文别名: 2-[2-[2-[Dodecyl-[2-[2-(2-hydroxyethoxy)ethoxy]ethyl]amino]ethoxy]ethoxy]ethanol
• CAS: 56975-19-0
• 化学式: C₂₄H₅₁NO₆
• 分子量: 449.672
• InChiKey: WUIKFHFMLNWBKR-UHFFFAOYSA-N

物化性质

• 沸点：
  545.0±45.0 °C(Predicted)
• 密度：
  0.993±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  31
• 可旋转键数：
  27
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  80.6
• 氢给体数：
  2
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  3,6,12,15-四氧杂-9-氮杂十七烷-1,17-二醇,9-十二烷基- 在 dipotassium hydrogenphosphate 、 palladium on activated charcoal 、 氢气 、 sodium carbonate 、 sodium hydroxide 作用下， 以 四氢呋喃 、 乙腈 为溶剂， 反应 112.0h， 生成
  参考文献：
  名称：

  Interfacial response of a novel gemini metallo-surfactant to ionic guest species

  摘要：

  The surface properties of a novel metallosurfactant with twin dodecyl aza-crown aliphatic tails (13) were studied by surface pressure isotherms on aqueous subphases of selected Group I and Group II metals. Mean molecular areas of the headgroup at the monolayer interface (gas phase) are observed to decrease in response to aqueous phase complexation of 13 by metal ions in the order Ca2+, Li+, Mg2+, Na+, Ba2+ and K+. The surface-tension derived critical micelle concentration of 13 at 25 C was 0.072 mM, while atomic force microscopy of aggregates observed after preparing Langmuir Blodgett multilayers on mica confirmed the formation of vesicles of up to 100 nm diameter, as opposed to wormlike micelles formed by the monomeric analogs. (C) Elsevier B.V. All Rights Reserved

  DOI：

  10.1016/j.inoche.2014.02.006
• 作为产物：
  描述：

  环氧乙烷 、 十二烷基伯胺 150.0 ℃ 、800.01 kPa 条件下， 反应 1.0h， 以98%的产率得到3,6,12,15-四氧杂-9-氮杂十七烷-1,17-二醇,9-十二烷基-
  参考文献：
  名称：

  一种低聚季铵盐型稠油降粘剂及其制备方法

  摘要：

  本发明属于石油开采技术领域，具体涉及一种低聚季铵盐型稠油降粘剂及其制备方法。所述稠油降粘剂为乙氧基季铵盐型低聚物。所述低聚物分子结构中的多个两亲基元之间存在较强的协同作用，在油水界面的排布更加紧密，从而具有优良的乳化能力。另一方面，其分子中含有多个EO基元，能够有效螯合稠油中的重金属离子，破坏金属离子与沥青质芳香片层的缔和，从而破坏沥青质聚集体结构。本发明所述乙氧基季铵盐型低聚表面活性剂单剂可有效降低高重金属含量稠油的粘度，降粘率可达76~95%。

  公开号：

  CN111170876B

文献信息

• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。
• Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10175578B2

  公开（公告）日：2019-01-08

  A pattern forming method includes coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sensitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X).

  一种图案形成方法包括将感光或感辐射树脂组合物涂布到基底上以形成感光或感辐射胶片，将用于形成保护膜的组合物涂布到感光或感辐射胶片上以形成保护膜，曝光覆盖有保护膜的感光或感辐射胶片、使用含有有机溶剂的显影剂对曝光的感光胶片或辐射敏感胶片进行显影，其中保护膜含有一种化合物 (A)，该化合物包括至少一个选自由醚键、硫醚键、羟基、硫醇基、羰基键和酯键组成的基团或键，以及一种树脂 (X)。
• Pattern forming method, resist pattern, and process for producing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10578968B2

  公开（公告）日：2020-03-03

  The present invention has an object to provide a pattern forming method capable of providing good DOF and EL, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method. The pattern forming method of the present invention includes a step a of coating an active-light-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, a step b of coating a composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, a step c of exposing the resist film having the upper layer film formed thereon, and a step d of developing the exposed resist film using a developer to form a pattern, in which the active-light-sensitive or radiation-sensitive resin composition contains a hydrophobic resin.

  本发明的目的是提供一种能够提供良好的DOF和EL的图案形成方法、一种由该图案形成方法形成的抗蚀剂图案，以及一种制造电子设备的方法，包括该图案形成方法。本发明的图案形成方法包括步骤 a：在基板上涂布活性光敏或辐射敏感树脂组合物以形成抗蚀剂薄膜；步骤 b：在抗蚀剂薄膜上涂布用于形成上层薄膜的组合物以在抗蚀剂薄膜上形成上层薄膜；步骤 c：曝光形成有上层薄膜的抗蚀剂薄膜；步骤 d：使用显影剂显影曝光的抗蚀剂薄膜以形成图案，其中活性光敏或辐射敏感树脂组合物包含疏水性树脂。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
  申请人：FUJIFILM Corporation

  公开号：US10928727B2

  公开（公告）日：2021-02-23

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

  根据本发明，提供了一种光敏或辐射敏感树脂组合物，其中包括在酸的作用下在碱显影剂中的溶解速率会降低的化合物（A）、疏水性树脂（B）和具有芳香环的树脂（C），以及使用该组合物的薄膜、掩膜坯、图案形成方法和电子设备制造方法。
• Synthesis and characterization of an amphiphilic cobalt cage complex with aza-crown spacer
  作者：Gina E. Jaggernauth、Richard A. Fairman

  DOI：10.1016/j.inoche.2010.09.036

  日期：2011.1

  The synthesis, spectrophotometric and surfactant properties of a novel amphiphilic cobalt cage metallosurfactant with an aza-oxa crown ether spacer and dodecyl hydrocarbon tail are reported. Surface pressure isotherms with Group I and Group II metal solution subphases indicate increasing interaction of the crown moiety with Ca2+, Na+, K+, Li+/Ba2+ and Mg2+ ions in that order, with mean molecular areas of the effective head group at the surface ranging from 141 angstrom(2) to 219 angstrom(2). The critical micelle concentrations determined by surface tension measurements of the unmetallated ligand and the metallosurfactant are 1.98 mM and 0.66 mM respectively. Wormlike micelles and vesicles are observed with atomic force microscopy after multilayer Langmuir Blodgett film deposition on a glass substrate. (C) 2010 Elsevier B.V. All rights reserved.