Derivatives of p-substituted phenyl ester of pivalic acid
申请人:ONO PHARMACEUTICAL CO., LTD.
公开号:EP0347168B1
公开(公告)日:1993-09-01
HIGHLY SEQUENCED COPOLYMER FOR DUAL-TONE PHOTORESISTS, RESIST COMPOSITION AND PATTERNING PROCESS THEREOF
申请人:Canton Litho Material Technology Inc.
公开号:US20220252981A1
公开(公告)日:2022-08-11
A resin including a highly sequenced copolymer is presented, and the preparation and application of its resist composition is presented. The resist has excellent performance and can promote the development of integrated circuits.