Novel sulfonium-based D–π–A photoacid generators (PAGs) with a benzene oligomer (from one to four) as a π-conjugated system that are highly photosensitive in the near-ultraviolet region (365 nm) were prepared. The maximum absorption and molar extinction coefficients of the PAGs redshifted and enhanced with the increasing length of the conjugated systems. The quantum yields of PAGs were high (three
制备了一种新的基于D的D-π-A光致产酸剂(PAG),其苯低聚物(从一到四个)作为π共轭体系,在近紫外线区域(365 nm)具有高感光度。随着共轭体系长度的增加,PAGs的最大吸收和摩尔消光系数发生红移和增强。PAG的量子产率很高(其中三个超过0.6),并且可以通过调节苯环的数量来提高。量子
化学计算结果证明,前沿轨道的分子构型和性质是影响PAG性能的关键因素。光聚合动力学结果表明,这些基于sulf的PAG是高效的阳离子光
引发剂,基于含PAG的SU-8
树脂的光刻性能评价i-线敏感性。另外,两光子吸收截面(δ700 nm > 400 GM)符合3D制备聚合物微结构的要求。