The photochemistry of matrixisolated (trifluoromethylsulfonyl) azide, CF3SO2N3, has been studied at low temperatures. Upon ArF laser irradiation (λ = 193 nm), the azide eliminates N2 and furnishes triplet [(trifluoromethyl)sulfonyl]nitrene, CF3SO2N, which has been characterized by IR and EPR spectroscopy. Upon subsequent UV light irradiation (λ = 260–400 nm) the nitrene converts to CF3N═SO2 and CF3S(O)NO
已在低温下研究了基质分离的(三氟甲基磺酰基)叠氮化物CF 3 SO 2 N 3的光化学性质。在ArF激光照射下(λ= 193 nm),叠氮化物消除了N 2并提供了三重态[(三氟甲基)磺酰基]丁二烯CF 3 SO 2 N,已通过IR和EPR光谱进行了表征。在随后的紫外线照射下(λ= 260–400 nm),通过Curtius型重排,氮烯转化为CF 3 N = SO 2和CF 3 S(O)NO。另外两个新的物种CF 2 N═SO 2 F和FSNO用CF一起识别2 NF,SO2,F 2 CO,CF 3 NO和SO作为副产物。此外,三重峰氮宾CF 3 n为通过其EPR和IR光谱检测。根据观察到的光解产物和量子化学计算,讨论了基质分离的CF 3 SO 2 N 3的复杂逐步光分解。
Fluorinated oxidant compounds containing a fluoramino group