申请人:AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
公开号:US10976662B2
公开(公告)日:2021-04-13
The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.
本专利申请涉及一种感光性正片工作感光组合物,特别适用于厚膜成像,该组合物可提供非常好的胶片均匀性,并在这些胶片成像和显影过程中,促进良好的加工纬度,防止图案特征崩溃。