1-[2,2-dimethyl-3-(2,2,2-trifluoroethoxy)propoxy]-2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-(hydroperoxymethyl)-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propane

• 分子结构分类: 有机化合物 - 有机氧化合物 - 有机氢过氧化物
• 英文名称: 1-[2,2-dimethyl-3-(2,2,2-trifluoroethoxy)propoxy]-2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-[[2-(hydroperoxymethyl)-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propoxy]methyl]-2-methyl-3-(2,2,2-trifluoroethoxy)propane
• 化学式: C₁₄₀H₂₂₂F₆₀O₄₁
• 分子量: 3701.1
• InChiKey: UYRWUALSWDEPFJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  29.7
• 重原子数：
  241
• 可旋转键数：
  138
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  389
• 氢给体数：
  1
• 氢受体数：
  101

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140087310A1

  公开（公告）日：2014-03-27

  A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.