Dimethyl(dipropyl)phosphanium;hydroxide

• 分子结构分类: 有机化合物 - 有机磷化合物 - 四烷基鏻化合物
• 英文名称: Dimethyl(dipropyl)phosphanium;hydroxide
• 英文别名: dimethyl(dipropyl)phosphanium;hydroxide
• 化学式: C8H21OP
• 分子量: 164.23
• InChiKey: CAIGDDBNQGXSJK-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.91
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• COLOR INHIBITOR FOR QUATERNARY AMMONIUM HYDROXIDE IN NON-AQUEOUS SOLVENT
  申请人：Sachem, Inc.

  公开号：EP2943465B1

  公开（公告）日：2017-03-15
• COMPOSITION, KIT, AND METHOD FOR TREATING SUBSTRATE
  申请人：FUJIFILM Corporation

  公开号：US20220119960A1

  公开（公告）日：2022-04-21

  An object of the present invention is to provide a composition that exhibits excellent dissolving ability and etching selectivity (particularly, etching selectivity for a Ru-containing substance and other metal-containing substances) to metal-containing substances (particularly, a Ru-containing substance), a kit for preparing the composition, and a method for treating a substrate by using the composition. The composition according to an embodiment of the present invention is a composition for removing metal-containing substances, and contains one or more periodic acid compounds selected from the group consisting of a periodic acid and a salt thereof, an azole compound, and an alkali compound.
• US9944853B2
  申请人：——

  公开号：US9944853B2

  公开（公告）日：2018-04-17
• [EN] COLOR INHIBITOR FOR QUATERNARY AMMONIUM HYDROXIDE IN NON-AQUEOUS SOLVENT<br/>[FR] INHIBITEUR DE COULEUR POUR HYDROXYDE D'AMMONIUM QUATERNAIRE DANS UN SOLVANT NON AQUEUX
  申请人：SACHEM INC

  公开号：WO2014110308A1

  公开（公告）日：2014-07-17

  A composition including a quaternary onium hydroxide in a non-aqueous solvent, wherein the quaternary ammonium hydroxide has a concentration in the range from about 5% by weight to about 50% by weight of the composition; and imidazolidine-2,4-dione, wherein the imidazolidine-2,4-dione has a concentration in the range from about 10 to about 5000 parts per million of the composition.
• [EN] COMPOSITION, KIT, AND TREATMENT METHOD FOR SUBSTRATE<br/>[FR] COMPOSITION, KIT ET PROCÉDÉ DE TRAITEMENT POUR SUBSTRAT<br/>[JA] 組成物、キット、基板の処理方法
  申请人：FUJIFILM CORP

  公开号：WO2021005980A1

  公开（公告）日：2021-01-14

  本発明は、金属含有物（特に、Ｒｕ含有物）の溶解能及びエッチング選択性（特に、Ｒｕ含有物と他の金属含有物とのエッチング選択性）に優れた組成物、これを調製するためのキット、並びに、これを用いた基板の処理方法を提供することを課題とする。　本発明の組成物は、金属含有物を除去するための組成物であって、過ヨウ素酸及びその塩からなる群より選択される１つ以上の過ヨウ素酸化合物と、アゾール化合物と、アルカリ化合物とを含む。