2-[(2-Carboxyacetyl)oxymethoxycarbonyl]-2-[(2-formyloxyacetyl)oxymethoxycarbonyl]propanedioic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-[(2-Carboxyacetyl)oxymethoxycarbonyl]-2-[(2-formyloxyacetyl)oxymethoxycarbonyl]propanedioic acid
• 英文别名: 2-[(2-carboxyacetyl)oxymethoxycarbonyl]-2-[(2-formyloxyacetyl)oxymethoxycarbonyl]propanedioic acid
• 化学式: C₁₃H₁₂O₁₆
• 分子量: 424.22
• InChiKey: CUQZZEMFGWDHSW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.9
• 重原子数：
  29
• 可旋转键数：
  17
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  243
• 氢给体数：
  3
• 氢受体数：
  16

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• VINYL-GROUP-CONTAINING FLUORENE COMPOUND
  申请人：DAICEL CORPORATION

  公开号：US20160046551A1

  公开（公告）日：2016-02-18

  A novel vinyl-group-containing fluorene compound and a method for producing the same, a polymerizable monomer and cross-linking agent including this compound, a leaving-group-containing fluorene compound, a monovinyl-group-containing fluorene compound, and methods for producing the same. This vinyl-group-containing fluorene compound is represented by formula (1). In the formula, W 1 and W 2 represent a group represented by formula (2), a group represented by formula (4), a hydroxyl group, or a (meth)acryloyloxy group, R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon, and n1 and n2 are integers of 0-4. In formulas (2) and (4), a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or a group represented by —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer of 0 or greater.

  一种含有乙烯基的萘化合物及其制备方法，包括该化合物的可聚合单体和交联剂，含有离去基的萘化合物，含有单乙烯基的萘化合物，以及其制备方法。该含有乙烯基的萘化合物由式（1）表示。在该式中，W1和W2代表由式（2）表示的基团，由式（4）表示的基团，羟基，或（甲基）丙烯氧基，R3a和R3b代表氰基，卤素原子，或一价碳氢化合物，n1和n2为0-4的整数。在式（2）和（4）中，环（Z）是芳香烃环，X是单键或由—S—表示的基团，R1是单键或C1-4烷基基团，R2是特定取代基团，如一价碳氢化合物，m为0或更大的整数。
• Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10023540B2

  公开（公告）日：2018-07-17

  To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.

  提供一种能使各种材料具有氢阻隔性能的氢阻隔剂；一种包括该氢阻隔剂的氢阻隔薄膜形成组合物；一种包括该氢阻隔剂的氢阻隔薄膜；一种使用该氢阻隔薄膜形成组合物生产氢阻隔薄膜的方法；以及一种带有该氢阻隔薄膜的电子元件。氢阻隔剂使用了一种具有特定结构的化合物，其中包括咪唑基团。此外，氢阻隔膜形成组合物是通过将上述氢阻隔剂与基础材料成分混合而制备的。此外，使用氢阻隔膜形成组合物形成氢阻隔膜。
• NOVEL COMPOUND
  申请人：Shiota Dai

  公开号：US20140221649A1

  公开（公告）日：2014-08-07

  A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R 1 and R 2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 indicates a single bond or an organic group. R 4 to R 9 each independently indicate a hydrogen atom, an organic group, etc., but R 6 and R 7 are never hydroxyl groups. R 10 indicates a hydrogen atom or an organic group.
• NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE
  申请人：Shiota Dai

  公开号：US20140231729A1

  公开（公告）日：2014-08-21

  A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R 1 and R 2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 indicates a single bond or an organic group. R 4 to R 9 each independently indicate a hydrogen atom, an organic group, etc., but R 6 and R 7 are never hydroxyl groups. R 10 indicates a hydrogen atom or an organic group.