4-(1-Adamantyl)-1,1-difluoro-4-oxo-2-(trifluoromethyl)butane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 4-(1-Adamantyl)-1,1-difluoro-4-oxo-2-(trifluoromethyl)butane-1-sulfonic acid
• 英文别名: 4-(1-adamantyl)-1,1-difluoro-4-oxo-2-(trifluoromethyl)butane-1-sulfonic acid
• 化学式: C₁₅H₁₉F₅O₄S
• 分子量: 390.4
• InChiKey: ZQAJPWMGSNPFSP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  25
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  79.8
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140234759A1

  公开（公告）日：2014-08-21

  According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R 1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.