[2-(2,2-Dimethylbutanoyloxy)-2-adamantyl]methyl adamantane-1-carboxylate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: [2-(2,2-Dimethylbutanoyloxy)-2-adamantyl]methyl adamantane-1-carboxylate
• 英文别名: [2-(2,2-dimethylbutanoyloxy)-2-adamantyl]methyl adamantane-1-carboxylate
• 化学式: C₂₈H₄₂O₄
• 分子量: 442.6
• InChiKey: YVTBCQRULNWWFP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  32
• 可旋转键数：
  8
• 环数：
  8.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ACTIVE LIGHT-SENSITIVE, OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN-FORMING METHOD USING SAME
  申请人：FUJIFILM Corporation

  公开号：US20160033862A1

  公开（公告）日：2016-02-04

  Provided is an active light-sensitive or radiation-sensitive resin composition with excellent exposure latitude and pattern roughness such as line width roughness, and a pattern-forming method using the same. The active light-sensitive or radiation-sensitive resin composition of the present invention contains (A) at least one type of a compound which is represented by General Formula (I) below and which generates an acid by irradiation with active light or radiation and (B) at least one type of a resin which includes a repeating unit which is represented by General Formula (1) below and of which, due to being decomposed by an action of an acid, the solubility increases with respect to an alkali developer.
• US9454079B2
  申请人：——

  公开号：US9454079B2

  公开（公告）日：2016-09-27