申请人:TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
公开号:US10468243B2
公开(公告)日:2019-11-05
In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.
在一种清洁基底的方法中,将包括尺寸改性材料的溶液涂抹在基底上,并在基底上放置待清除的颗粒。从颗粒和尺寸改性材料中产生尺寸比颗粒大的尺寸改性颗粒。尺寸改性颗粒被从基底上去除。