Various embodiments disclosed related to methods of treating subterranean formations as well as compositions and systems for performing the same. In various embodiments, the present invention provides a method of treating a subterranean formation that includes obtaining or providing a composition including a compound including at least one silylating group and at least one ammonium group. The method also includes placing the composition in a subterranean formation.
本发明公开的各种实施方案涉及处理地下地层的方法以及用于处理地下地层的组合物和系统。在各种实施方案中,本发明提供了一种处理地下地层的方法,该方法包括获得或提供一种组合物,该组合物包括至少一个
硅烷化基团和至少一个
铵基团的化合物。该方法还包括将该组合物置于地下岩层中。