(1-Cyanopropylideneamino) ethanesulfonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: (1-Cyanopropylideneamino) ethanesulfonate
• 英文别名: (1-cyanopropylideneamino) ethanesulfonate
• 化学式: C₆H₁₀N₂O₃S
• 分子量: 190.22
• InChiKey: YQCKLEXBDDKTRB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  12
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  87.9
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
  申请人：Dazai Takahiro

  公开号：US20100178609A1

  公开（公告）日：2010-07-15

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R 1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R 2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, a carbonate linkage (—O—C(═O)—O—), —S—, —S(═O) 2 —, —S(═O) 2 —O—, —NH—, —NR 04 — (wherein, R 04 represents an alkyl group or an acyl group), and —NH—C(═O)—; and R 3 represents a cyclic group containing a sulfonyl group within the ring skeleton).

  一种抗蚀组合物，包括一种基础组分（A）和一种酸发生器组分（B），其中基础组分（A）在酸的作用下在碱性显影液中表现出改变的溶解度，基础组分（A）包括一种聚合物化合物（A0），其含有由下式（a0-1）表示的结构单元（a0）：（其中，R1表示氢原子、烷基或卤代烷基；R2表示至少包含一种来自羟基、酰基、碳酸酯键（—O—C（═O）—O—）、碳酰基（—C（═O）—）、磺酰基、磺酰基氧、氨基、取代基为烷基或酰基的氮原子和氨基甲酰的偶联基的双价连接基；R3表示环状基团，其在环骨架内含有磺酰基）。
• POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20090162785A1

  公开（公告）日：2009-06-25

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R 0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  本发明提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负型抗蚀组合物和其制备方法。本发明是一种聚合物化合物，其中包含下式所示的通式（a0-1）所代表的结构单元（a0）。（其中，R代表氢原子、卤素原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明还提供了一种负型抗蚀组合物，包括：碱溶性树脂组分（A）、在曝光时生成酸的酸发生器组分（B）和交联剂（C），其中碱溶性树脂组分（A）含有具有上述通式（a0-1）所代表的结构单元（a0）的聚合物化合物（A1）。
• POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
  申请人：Shimizu Hiroaki

  公开号：US20090214982A1

  公开（公告）日：2009-08-27

  There is provided a positive resist composition, including a base component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R 1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a bivalent linking group; B represents a bivalent linking group; and R 2 represents an acid dissociable, dissolution inhibiting group).

  提供了一种正性光刻胶组合物，包括一种基础组分(A)，在酸的作用下在碱性显影液中表现出增加的溶解度，以及一种酸发生剂组分(B)，在曝光时产生酸。其中，基础组分(A)包括一种聚合物化合物(A1)，其中包含一个由下式(a0-1)表示的结构单元(a0)：（其中，R1表示氢原子、低碳基或卤代低碳基；A表示双价连接基团；B表示双价连接基团；R2表示酸解离、抑制溶解的基团）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：Ishiduka Keita

  公开号：US20090104563A1

  公开（公告）日：2009-04-23

  There is provided a compound represented by a general formula (B1-1) shown below, an acid generator composed of the above compound, a resist composition containing an acid generator composed of the above compound, and a method of forming a resist pattern: (wherein R X represents a hydrocarbon group which may contain a substituent group; Q 1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y 1 represents an alkylene group of 1 to 4 carbon atoms, or a fluorinated alkylene group of 1 to 4 carbon atoms; and A + represents an organic cation which contains a nitrogen atom).

  提供了一个化合物的通式（B1-1），如下所示，其中包含上述化合物的酸发生剂，包含上述化合物的抗蚀剂组合物，以及形成抗蚀剂图案的方法：（其中RX代表可能含有取代基的碳氢基团；Q1代表1至12个碳原子的烷基团，可能含有取代基，或单键；n代表0或1的整数；Y1代表1至4个碳原子的烷基团，或1至4个碳原子的氟代烷基团；A+代表含有氮原子的有机阳离子）。
• Positive resist composition & process for forming resist pattern using same
  申请人：Central Glass Company, Limited

  公开号：EP1103856A1

  公开（公告）日：2001-05-30

  A positive resist composition contains (a) an acrylic resin which is subject to a change in solubility in a basic aqueous solution, the acrylic resin comprising an acrylic or methacrylic acid ester unit comprising an ester moiety comprising a fluorine-containing group; and (b) a photoacid generator capable of releasing an acid when irradiated with a laser. The composition is high in transparency to vacuum ultraviolet laser beams, particularly the F2 excimer laser beam, and high in sensitivity.

  一种正抗蚀剂组合物包含：(a) 一种在碱性水溶液中溶解度会发生变化的丙烯酸树脂，该丙烯酸树脂包含一个丙烯酸或甲基丙烯酸酯单元，该单元包含一个含氟基团的酯；(b) 一种光酸发生器，该光酸发生器能够在激光照射时释放出一种酸。该组合物对真空紫外线激光束，特别是 F2 准分子激光束具有高透明度和高灵敏度。