(2,2,3,3,4,4,5,5,6,6-Decafluorocyclohexyl) 2,2-dimethylbutanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: (2,2,3,3,4,4,5,5,6,6-Decafluorocyclohexyl) 2,2-dimethylbutanoate
• 英文别名: (2,2,3,3,4,4,5,5,6,6-decafluorocyclohexyl) 2,2-dimethylbutanoate
• 化学式: C₁₂H₁₂F₁₀O₂
• 分子量: 378.21
• InChiKey: DNIOGLGCISKXHO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  12

文献信息

• PHOTORESIST OVERCOAT COMPOSITIONS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160122574A1

  公开（公告）日：2016-05-05

  Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.

  提供了光阻覆盖层组合物。该组合物包括：基质聚合物、添加剂聚合物、碱性淬灭剂和有机溶剂。添加剂聚合物的表面能低于基质聚合物的表面能，并且添加剂聚合物在覆盖层组合物中的总固体量的1至20重量％的范围内存在。该组合物在半导体制造业中具有特定的适用性，用于负性调色剂开发过程。
• PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20150252216A1

  公开（公告）日：2015-09-10

  A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.
• US9581904B2
  申请人：——

  公开号：US9581904B2

  公开（公告）日：2017-02-28