(E)-3-ethylhex-2-enoic acid

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: (E)-3-ethylhex-2-enoic acid
• 化学式: C₈H₁₄O₂
• 分子量: 142.2
• InChiKey: WRPMHFHMXOUTTI-VOTSOKGWSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Process for Preparing an Overbased Detergent
  申请人：Kocsis A. Jody

  公开号：US20060178278A1

  公开（公告）日：2006-08-10

  The invention relates to a process for preparing an overbased metal detergent in an oil medium comprising the steps of: (1) providing a metal salt selected from the group consisting of a hydrocarbyl-substituted organic acid; a hydrocarbyl-substituted phenol, a phenate, a hydrocarbyl-substituted carboxylate and mixtures thereof; (2) further providing methanol and a mixture of alcohols containing 2 to about 7 carbon atoms, wherein the mole ratio of methanol to the mixture of alcohols is about 2.2 or less, to form a mixture; (3) further providing a basic metal compound; (4) reacting the mixture of step (3) with carbon dioxide to form a carbonated overbased metal sulphonate; (5) performing steps (3) and (4) at least three additional times upon the product of step (4); (6) thereafter removing at least a portion of the water produced in steps (1)-(5) and of the alcohols introduced in step (2); (7) performing step (2) again, upon the product of step (6); (8) performing steps (3) and (4) at least two additional times upon the product of step (7); and (9) thereafter removing a substantial portion of the water and of the alcohols from the composition; wherein the oil medium is present in an amount such that the weight ratio of the acid corresponding to the metal salt of (1) to the oil medium is 0.3 to 1.4; and wherein step (6) is required when the hydrocarbyl-substituted organic acid is a hydrocarbyl-substituted sulphonic acid. The invention further relates to its use in internal combustion engines.

  该发明涉及一种在油介质中制备过基金属清洁剂的方法，包括以下步骤：（1）提供一种选自羟烃基取代有机酸、羟烃基取代酚、酚酸盐、羟烃基取代羧酸盐及其混合物的金属盐；（2）进一步提供甲醇和含有2至约7个碳原子的醇混合物，其中甲醇与醇混合物的摩尔比约为2.2或更低，形成混合物；（3）进一步提供一种碱性金属化合物；（4）将步骤（3）的混合物与二氧化碳反应，形成碳酸盐过基金属磺酸盐；（5）对步骤（4）的产物至少进行三次以上的步骤（3）和（4）；（6）随后至少去除步骤（1）至（5）中产生的部分水和步骤（2）中引入的醇；（7）对步骤（6）的产物再次执行步骤（2）；（8）对步骤（7）的产物至少进行两次以上的步骤（3）和（4）；（9）随后从组合物中去除大部分水和醇；其中油介质的量使得步骤（1）中金属盐对应的酸与油介质的重量比为0.3至1.4；当羟烃基取代有机酸为羟烃基取代磺酸时，需要步骤（6）。该发明还涉及该方法在内燃机中的应用。
• Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
  申请人：BASF SE

  公开号：EP2428541A1

  公开（公告）日：2012-03-14

  An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.

  发现了一种水性抛光组合物，所述水性抛光组合物包括 (A) 至少一种磨料颗粒，分散在不含组分（B）的水介质中时带正电，从电泳迁移率看，其 pH 值在 3 至 9 之间； (B) 至少一种水溶性聚合物，选自由线性和支链环氧亚烷基均聚物和共聚物组成的 组；以及 (C) 至少一种阴离子磷酸盐分散剂； 以及一种利用该水性抛光组合物对电气、机械和光学设备的基底材料进行抛光的工艺。
• Method of polishing a silicon-containing dielectric
  申请人：Cabot Microelectronics Corporation

  公开号：US20040152309A1

  公开（公告）日：2004-08-05

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 4 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 4 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。
• Readily deinkable toners
  申请人：Carter W. Phillip

  公开号：US20060196848A1

  公开（公告）日：2006-09-07

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 3 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 3 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。
• SALTS OF PAROXETINE
  申请人：SMITHKLINE BEECHAM PLC

  公开号：EP1091958A1

  公开（公告）日：2001-04-18