Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
本发明提供了具有二元酸根离子基团的新型对称和非对称双功能光解基(PDBs),其显示出增强的成像性能。此外,还提供了使用双功能二
羧酸基PDBs制备的光刻胶组合物和使用本发明的光刻胶组合物的光刻方法。