1-Propanesulfonic acid, 3,3'-dithiobis- | 17661-52-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1-Propanesulfonic acid, 3,3'-dithiobis-
• 英文别名: 3-(3-sulfopropyldisulfanyl)propane-1-sulfonic acid
• CAS: 17661-52-8
• 化学式: C₆H₁₄O₆S₄
• 分子量: 310.4
• InChiKey: LMPMFQXUJXPWSL-UHFFFAOYSA-N

物化性质

• 密度：
  1.611±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.6
• 重原子数：
  16
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  176
• 氢给体数：
  2
• 氢受体数：
  8

文献信息

• [EN] ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS<br/>[FR] BAIN ACIDE DE DEPOT ELECTROLYTIQUE D'UNE COUCHE DE CUIVRE CONTENANT DES COMPOSES DE PHENAZINIUM HALOGENES OU PSEUDOHALOGENES MONOMERIQUES
  申请人：ATOTECH DEUTSCHLAND GMBH

  公开号：WO2005049584A1

  公开（公告）日：2005-06-02

  For manufacturing particularly uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density, halogenated or pseudohalogenated monomeric pheanzinium compounds or a purity at least 85 mole-% and having the general chemical formula (I) are utilized in which R1, R2, R3, R4. R5, R6, R7, R7’’, R8, R9, X and A¯have the significations denoted in the claims. The compounds are prepared by diazotizing a suited starting compound prior to halogenating or pseudohalogenating it in the presence of mineral acid, diazotization means and halide or pseudohalide, with the reaction steps being run in one single vessel.

  为了制造特别均匀和镜面明亮的铜涂层，同时使用相对较高的电流密度，利用含有至少85摩尔％纯度并具有一般化学式（I）的卤代或假卤代单体苯并离子化合物，这些涂层具有平整和韧性，其中R1，R2，R3，R4，R5，R6，R7，R7’’，R8，R9，X和A¯具有所述权利要求所示的含义。在矿物酸，重氮化剂和卤化物或假卤化物的存在下，通过重氮化适当的起始化合物然后卤代或假卤代它来制备这些化合物，反应步骤在一个单一的容器中进行。
• PYRIDINIUM COMPOUNDS, A SYNTHESIS METHOD THEREFOR, METAL OR METAL ALLOY PLATING BATHS CONTAINING SAID PYRIDINIUM COMPOUNDS AND A METHOD FOR USE OF SAID METAL OR METAL ALLOY PLATING BATHS
  申请人：Atotech Deutschland GmbH

  公开号：US20200231565A1

  公开（公告）日：2020-07-23

  The present invention concerns pyridinium compounds, a synthesis method for their preparation, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths. The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.

  本发明涉及吡啶化合物、其制备的合成方法、含有所述吡啶化合物的金属或金属合金电镀浴以及使用所述金属或金属合金电镀浴的方法。这些电镀浴特别适用于填充电子和半导体行业中的凹陷结构，包括双重达曼赛应用。
• Imidazoyl urea polymers and their use in metal or metal alloy plating bath compositions
  申请人：Atotech Deutschland GmbH

  公开号：US11066553B2

  公开（公告）日：2021-07-20

  The present invention relates to imidazoyl urea polymers and their use in aqueous acidic plating baths for metal or metal alloy deposition such as electrolytic deposition of copper or alloys thereof in the manufacture of printed circuit boards, IC substrates, semiconducting and glass devices for electronic applications. The plating bath according to the present invention comprises at least one source of metal ions and an imidazoyl urea polymer. The plating bath is particularly useful for filling recessed structures and build-up of pillar bump structures.

  本发明涉及咪唑基脲聚合物及其在水性酸性电镀浴中的应用，用于金属或金属合金沉积，例如在制造印刷电路板、集成电路基板、半导体和电子应用玻璃器件中的铜或其合金的电解沉积。根据本发明的电镀浴包括至少一种金属离子来源和一种咪唑基脲聚合物。该电镀浴特别适用于填充凹陷结构和构建柱形凸起结构。
• Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit
  申请人：Brunner Heiko

  公开号：US20060226021A1

  公开（公告）日：2006-10-12

  For the reproducible manufacturing of particularly uniform and brilliant i.e., highly bright copper coatings that are leveled and ductile as well, a copper plating bath is utilized that contains as an additive a mixture of oligomeric phenazinium compounds. The mixture contains at least one phenazinium compound selected from the group comprising compounds containing two monomeric units and compounds containing three monomeric units having the general chemical formulae and set forth in the patent claims and in the specification as well as further oligomeric phenazinium compounds.

  为了实现制造特别均匀、亮度高且具有平整和可塑性的铜涂层，使用了含有寡聚苯并咪唑化合物混合物的铜电镀浴液作为添加剂。该混合物至少包含一种苯并咪唑化合物，所述化合物包括含有两个单体单元和含有三个单体单元的化合物，其具有在专利要求和说明书中所列出的化学式和，以及其他寡聚苯并咪唑化合物。
• Method for manufacturing an electrochemical-based analytical test strip with hydrophilicity enhanced metal electrodes
  申请人：Lifescan Scotland Limited

  公开号：EP1717319A2

  公开（公告）日：2006-11-02

  A method for manufacturing a portion of an electrochemical-based test strip comprising includes forming a metal electrode(s) with an upper surface on a surface of an electrically-insulating substrate. The method also includes treating the upper surface of the metal electrode(s) with a hydrophilicity-enhancing composition to form a treated upper surface on the metal electrode with hydrophilicity-enhancing chemical moieties thereon and depositing an enzymatic reagent layer on the treated upper surface of the metal electrode(s).

  一种制造基于电化学的测试带的一部分的方法，包括在电绝缘基底的表面上形成具有上表面的金属电极。该方法还包括用亲水性增强组合物处理金属电极的上表面，以在金属电极上形成具有亲水性增强化学分子的处理过的上表面，并在金属电极处理过的上表面上沉积酶试剂层。