Butyl-β-trifluorpropionat | 63456-48-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Butyl-β-trifluorpropionat
• 英文别名: Butyl 3,3,3-trifluoropropanoate
• CAS: 63456-48-4
• 化学式: C₇H₁₁F₃O₂
• 分子量: 184.158
• InChiKey: WPMHFXGENQDHSS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  12
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALT, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING THE SAME
  申请人：Shibata Norio

  公开号：US20120130090A1

  公开（公告）日：2012-05-24

  A trifluoromethylthiophenium derivative salt useful as synthetic intermediates for pharmaceuticals and agrochemicals, a method for producing the same, and a method for producing trifluoromethyl-containing compounds using the same are provided. An S-(trifluoromethyl)-benzo[b]thiophenium derivative salt is represented by the following general formula (1): wherein R 1 , R 2 , R 3 , and R 4 are each independently a hydrogen atom, a methyl group, an ethyl group, a linear, branched, or cyclic alkyl group having 3 to 10 carbon atoms, a methoxy group, an ethoxy group, a linear, branched, or cyclic alkyloxy group having 3 to 10 carbon atoms, a fluorine atom, a chlorine atom, a bromine atom, a nitro group, or a cyano group, R 5 is a methyl group, an ethyl group, a linear, branched, or cyclic alkyl group having 3 to 10 carbon atoms, a phenyl group, or a substituted phenyl group, and X − represents an anion. Various trifluoromethyl-containing compounds are produced using a method for producing the S-(trifluoromethyl)-benzo[b]thiophenium derivative salt, and using the S-(trifluoromethyl)-benzo[b]thiophenium derivative salt as a trifluoromethylating agent.

  本发明提供一种三氟甲基噻吩盐衍生物，可用作制药和农药的合成中间体，以及其制备方法和使用该盐衍生物制备含三氟甲基化合物的方法。S-(三氟甲基)-苯并[b]噻吩盐衍生物由下列普通式（1）表示：其中，R1、R2、R3和R4各自独立地是氢原子、甲基基团、乙基基团、具有3至10个碳原子的线性、支链或环烷基基团、甲氧基基团、乙氧基基团、具有3至10个碳原子的线性、支链或环烷氧基基团、氟原子、氯原子、溴原子、硝基或氰基，R5是甲基基团、乙基基团、具有3至10个碳原子的线性、支链或环烷基基团、苯基或取代苯基，X-表示阴离子。使用制备S-(三氟甲基)-苯并[b]噻吩盐衍生物的方法以及使用S-(三氟甲基)-苯并[b]噻吩盐衍生物作为三氟甲基化试剂可以制备各种三氟甲基含量的化合物。
• Novel polymers, resist compositions and patterning process
  申请人：——

  公开号：US20010033989A1

  公开（公告）日：2001-10-25

  Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F 2 excimer laser light are obtained.

  具有氟酯基团的聚合物是新型的。使用这些聚合物，可以获得具有低吸收F2准分子激光光的抗蚀剂组成物。
• Polymer, chemically amplified resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020004569A1

  公开（公告）日：2002-01-10

  Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F 2 excimer laser light are obtained.

  由含有氟化烷基的环氧烷重复单元组成的高分子是新颖的，并且具有透明度和碱溶性。使用这些高分子，可以获得低吸收F2准分子激光光的抗蚀剂组成物。
• Fluorine-containing polymers, resist compositions and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1126322A2

  公开（公告）日：2001-08-22

  Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

  具有氟化酯基团的聚合物是一种新型聚合物。使用这种聚合物可获得对 F2 准分子激光吸收率低的抗蚀剂组合物。
• SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1679314A1

  公开（公告）日：2006-07-12

  A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

  本发明提供了一种适用于作为化学放大抗蚀剂的树脂成分的新型聚硅氧烷，该抗蚀剂具有特别优异的 I-D 偏压和焦深（DOF）等性能；一种可用作合成该聚硅氧烷的原料的新型硅烷化合物；以及一种包含该聚硅氧烷的辐射敏感树脂组合物。 硅烷化合物如下式（I）所示、 而聚硅氧烷具有下式（1）所示的结构单元、 其中 R 是烷基，R1 和 R2 分别代表氟原子、低级烷基或低级氟烷基，n 是 0 或 1，k 是 1 或 2，i 是 0 至 10 的整数。 辐射敏感树脂组合物包括聚硅氧烷和光酸发生器。