COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
申请人:JSR Corporation
公开号:EP1235104A1
公开(公告)日:2002-08-28
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.
一种对辐射敏感的折射率变化组合物,包括:(A)可分解化合物;(B)折射率低于可分解化合物(A)的不可分解化合物;(C)对辐射敏感的分解剂;以及(D)稳定剂。通过图案掩膜将组合物暴露在辐射下,暴露部分的上述成分(C)和(A)被分解,暴露部分和未暴露部分之间产生折射率差,从而形成具有不同折射率的图案。