Photopolymerizable composition consisting essentially of (A) at least one ethylenically unsaturated monomeric compound, (B) at least one 2,4,5-triarylimidazolyl dimer, (C) sensitizing amount of at least one polymeric sensitizer, weight average molecular weight 10,000 to 300,000, which is the reaction product of (1) a reactive photosensitizer and (2) a reactive polymer as defined herein, and (D) optionally an organic polymeric binder. The compositions are useful in photoresists, chemical milling, toning films and printing plates.
光敏聚合物组合物,基本包括(A) 至少一种
乙烯基不饱和单体化合物,(B) 至少一种2,4,5-三芳基
咪唑二聚体,(C) 至少一种敏化剂的感光量,分子量为10,000至300,000的聚合物敏化剂,其是由(1) 反应性光敏剂和(2) 本文所定义的反应性聚合物的反应产物,以及(D) 可选的有机聚合物粘合剂。该组合物在光阻、
化学刻蚀、调色膜和印刷板中有用。