申请人:KABUSHIKI KAISHA TOSHIBA
公开号:US20030222048A1
公开(公告)日:2003-12-04
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
一种形成图案的材料包含嵌段共聚物或接枝共聚物,并形成具有微观聚合物相的结构,在其中,关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链,构成各自聚合物链的单体单位的N/(Nc-No)值之比为1.4或更高,其中N表示单体单位中的总原子数,Nc表示单体单位中的碳原子数,No表示单体单位中的氧原子数。