Decanoic acid, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-octadecafluoro- | 112823-28-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: Decanoic acid, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-octadecafluoro-
• 英文别名: 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-octadecafluorodecanoic acid
• CAS: 112823-28-6
• 化学式: C₁₀H₂F₁₈O₂
• 分子量: 496.09
• InChiKey: OCDHRWMTOBLTSC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6
• 重原子数：
  30
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  20

文献信息

• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
• Method of forming laminated resist
  申请人：Araki Takayuki

  公开号：US20070196763A1

  公开（公告）日：2007-08-23

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L 1 ) on a substrate and (II) a step for forming the antireflection layer (L 2 ) on the photoresist layer (L 1 ) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
• Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern
  申请人：Yoshimura Nakaatsu

  公开号：US20080124524A1

  公开（公告）日：2008-05-29

  An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.