1H-Benzotriazol Morpholin salt | 84604-74-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并三唑类
• 英文名称: 1H-Benzotriazol Morpholin salt
• 英文别名: Einecs 283-357-7；2H-benzotriazole;morpholine
• CAS: 84604-74-0
• 化学式: C₄H₉NO*C₆H₅N₃
• 分子量: 206.247
• InChiKey: OZIKLUQNNGASRY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.56
• 重原子数：
  15
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  62.8
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  吗啉 、 T406石油添加剂 以 醋酸异丙酯 为溶剂， 以6.4 g的产率得到1H-Benzotriazol Morpholin salt
  参考文献：
  名称：

  苯并三唑-胺配合物的协同性：分子识别界面的变构调节

  摘要：

  苯并三唑与胺形成稳定的络合物，在某些情况下会从极性有机溶剂的溶液中以晶体形式自发分离。这些配合物的化学计量和结合常数已通过在氘代氯仿中的1 H NMR分析确定。络合过程中涉及的平衡的定量分析揭示了溶液中苯并三唑的行为，并给出了当存在多种相互作用时变构效应的影响的估计值。版权所有©2010 John Wiley＆Sons，Ltd.

  DOI：

  10.1002/poc.1715

文献信息

• CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1679361A1

  公开（公告）日：2006-07-12

  The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate, and without causing corrosion or oxidation of metal wirings, in particular, copper wirings, provided on a surface of substrate, and can further remove at the same time a carbon defect present on a surface of substrate, without removing a metal corrosion inhibitor - Cu film, in particular, a Cu-BTA film. The present invention provides a cleaning agent for a substrate comprising [I] an organic acid having at least one carboxyl group and/or [II] a complexing agent, and [III] an organic solvent selected from the group consisting of (1) monohydric alcohols, (2) alkoxyalcohols, (3) glycols, (4) glycol ethers, (5) ketones and (6) nitriles, and a cleaning method for a surface of substrate, which comprises the surface of substrate is treated with said cleaning agent.

  本发明提供了一种用于基板的清洗剂及其清洗方法，该清洗剂可有效去除存在于基板表面的细小颗粒（微粒）或来自各种金属的杂质（金属杂质），而不会导致基板（尤其是半导体基板）表面粗糙，也不会导致设置在基板表面的金属线（尤其是铜线）腐蚀或氧化，并可进一步同时去除存在于基板表面的碳缺陷，而不会去除金属缓蚀剂-Cu膜（尤其是Cu-BTA膜）。 本发明提供了一种用于基材的清洗剂，包括[I]具有至少一个羧基的有机酸和/或[II]络合剂，以及[III]选自以下组别的有机溶剂：(1)一元醇、(2)烷氧基乙醇、(3)乙二醇、(4)乙二醇醚、(5)酮和(6)腈。
• Cleaning Agent for Substrate and Cleaning Method
  申请人：Mizuta Hironori

  公开号：US20070235061A1

  公开（公告）日：2007-10-11

  The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate, and without causing corrosion or oxidation of metal wirings, in particular, copper wirings, provided on a surface of substrate, and can further remove at the same time a carbon defect present on a surface of substrate, without removing a metal corrosion inhibitor—Cu film, in particular, a Cu-BTA film. The present invention provides a cleaning agent for a substrate comprising [I] an organic acid having at least one carboxyl group and/or [II] a complexing agent, and [III] an organic solvent selected from the group consisting of (1) monohydric alcohols, (2) alkoxyalcohols, (3) glycols, (4) glycol ethers, (5) ketones and (6) nitriles, and a cleaning method for a surface of substrate, which comprises the surface of substrate is treated with said cleaning agent.
• US8900371B2
  申请人：——

  公开号：US8900371B2

  公开（公告）日：2014-12-02
• Cooperativity in benzotriazole-amine complexes: allosteric tuning of molecular recognition interfaces
  作者：Cristiano Zonta、Ottorino De Lucchi、Riccardo Motterle、Siro Serafini

  DOI：10.1002/poc.1715

  日期：2011.2

  Benzotriazole forms with amines stable complexes that in some cases separate spontaneously as crystals from solutions of polar organic solvents. The stoichiometries and the binding constants of these complexes have been determined by 1H NMR analysis in deuterochloroform. The quantitative analysis of the equilibria involved in the complexation process sheds light on the behaviour of benzotriazoles in

  苯并三唑与胺形成稳定的络合物，在某些情况下会从极性有机溶剂的溶液中以晶体形式自发分离。这些配合物的化学计量和结合常数已通过在氘代氯仿中的1 H NMR分析确定。络合过程中涉及的平衡的定量分析揭示了溶液中苯并三唑的行为，并给出了当存在多种相互作用时变构效应的影响的估计值。版权所有©2010 John Wiley＆Sons，Ltd.