2-Hydroxyethyl 2-cyanoprop-2-enoate | 81524-96-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-Hydroxyethyl 2-cyanoprop-2-enoate
• CAS: 81524-96-1
• 化学式: C₆H₇NO₃
• 分子量: 141.12
• InChiKey: FCDPKPULJHOKEK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  70.3
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• (N-substituted carbamoyloxy)alkanoyloxyalkyl acrylate polymers and compositions made therefrom
  申请人：UNION CARBIDE CORPORATION

  公开号：EP0297577A2

  公开（公告）日：1989-01-04

  This invention is directed to polymers (including oligomers) that contain (N-substituted carbamoyloxy)alkanoyloxyalkyl acrylates, to a process for their preparation by reacting the carbamoyloxy alkanoyloxyalkyl acrylates with other ethylenically unsaturated monomers, and to coating, ink, adhesive, and sealant compositions (including the cured coatings, inks, adhesives, and sealants) that are obtained by crosslinking the above compositions by various means. The cured compositions, which are, for example, high-quality industrial finishes, sealants or encapsulants, are made by incorporation of various conventional crosslinking agents and other normally-used formulating ingredients with the polymeric compositions of the invention.

  本发明涉及含有（N-取代氨基甲酰氧基）烷酰氧基烷基丙烯酸酯的聚合物（包括低聚物），通过氨基甲酰氧基烷酰氧基烷基丙烯酸酯与其他乙烯基不饱和单体反应制备它们的工艺，以及通过各种方法交联上述组合物而得到的涂料、油墨、粘合剂和密封剂组合物（包括固化的涂料、油墨、粘合剂和密封剂）。本发明的固化组合物是通过在本发明的聚合物组合物中加入各种常规交联剂和其他常用配方成分制成的，例如高质量的工业涂饰剂、密封剂或封装剂。
• POSITIVE TYPE RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING PATTERN WITH THE SAME
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP1229390A1

  公开（公告）日：2002-08-07

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种正向工作的辐射敏感组合物，其特征在于它含有符合 a1) 至 a3) 中任一条件的化合物，以及 b) 一种通过辐射产生酸的酸发生器；本发明还涉及一种使用这种组合物生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的酸性基团所保护 (R1和R2为芳香环，R3代表烷基、取代烷基、环烷基或芳香环。R1 至 R3 可以相同或不同）。 a2)一种化合物，其中的碱溶性基团被通式（2）所代表的酸性基团所保护 (R4至R6各自为烷基、取代烷基、环烷基或芳香环，且R4至R6中至少有一个为带有电子奉献基团的芳香环。R4 至 R6 可以相同或不同)。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• Positive type radiation-sensitive composition and process for processing for producing pattern with the same
  申请人：——

  公开号：US20030003392A1

  公开（公告）日：2003-01-02

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) 1 (R 1 and R 2 are aromatic rings, and R 3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R 1 to R 3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) 2 (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R 4 to R 6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种积极工作的辐射敏感组合物，其特征在于它含有符合 a1）至 a3）中任一条件的化合物，以及 b）一种通过辐射产生酸的酸发生器；本发明还涉及一种用其生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的易酸基团所保护 1 (R 1 和 R 2 是芳香环，R 3 代表烷基、取代烷基、环烷基或芳香环。R 1 至 R 3 可以相同或不同）。 a2) 碱溶性基团被通式（2）所代表的酸性基团保护的化合物 2 (R4 至 R6 各为烷基、取代烷基、环烷基或芳香环，且 R4 至 R6 中至少有一个是带有电子奉献基团的芳香环。R 4 至 R 6 可以相同或不同）。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• (N-Substituted carbamoyloxy)alkyleneoxyhydrocarbyl acrylate esters
  申请人：UNION CARBIDE CORPORATION

  公开号：EP0036813B1

  公开（公告）日：1984-06-06
• N-substituted carbamoyloxy alkanoyloxyhydrocarbyl acrylate esters
  申请人：UNION CARBIDE CORPORATION

  公开号：EP0037314B2

  公开（公告）日：1988-02-10