申请人:Babich John W.
公开号:US20110008253A1
公开(公告)日:2011-01-13
A manufacturing process for the preparation of radiolabeled compounds of formula (I)
includes reacting compounds of formula (II) with a source of readionuclide of a halogen in the presence of an oxidant under acidic condition,
wherein:
*I is
123
I,
124
I,
125
I or
131
I;
R is lower alkyl, optionally substituted with one or more fluorine atoms;
Q is C(O), O, NR′, S, S(O)
2
, C(O)
2
, (CH
2
)
p
;
Y is C(O), O, NR′, S, S(O)
2
, C(O)
2
, (CH
2
)
p
;
R′ is H, C(O), S(O)
2
, C(O)
2
;
Z is H, C
1
-C
4
alkyl, benzyl, substituted benzyl or trialkylsilyl;
m is 0, 1, 2, 3, 4 or 5;
n is 0, 1, 2, 3, 4, 5 or 6; and
p is 0, 1, 2, 3, 4, 5 or 6.