三(2-羟乙基)甲基氢氧化铵 | 33667-48-0

• 物质功能分类: 化学试剂 - 有机试剂 - 胺盐（铵盐）
• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 三(2-羟乙基)甲基氢氧化铵
• 中文别名: 三(2-羟乙基)甲基氢氧化胺；三(2-羟乙基)甲基氢氧化铵(45-5%的水溶液)(含稳定剂甲氧基氢醌)
• 英文名称: tris-(2-hydroxyethyl)methylammonium hydroxide
• 英文别名: methyl triethanol ammonium hydroxide；Tris(2-hydroxyethyl)methylammonium hydroxide；tris(2-hydroxyethyl)-methylazanium;hydroxide
• CAS: 33667-48-0
• 化学式: C₇H₁₈NO₃*HO
• 分子量: 181.232
• InChiKey: IJGSGCGKAAXRSC-UHFFFAOYSA-M

物化性质

• 物理描述：
  Liquid

计算性质

• 辛醇/水分配系数(LogP)：
  -1.77
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  61.7
• 氢给体数：
  4
• 氢受体数：
  4

安全信息

• 危险等级：
  8
• 海关编码：
  2923900090

反应信息

• 作为反应物：
  描述：

  三(2-羟乙基)甲基氢氧化铵 、 丙酸 以 水 为溶剂， 反应 10.0h， 生成 trishydroxyethylmethylammonium propionate
  参考文献：
  名称：

  CN108484420

  摘要：

  公开号：
• 作为产物：
  描述：

  环氧乙烷 、 N-甲基二乙醇胺 在 水 作用下， 30.0 ℃ 、344.75 kPa 条件下， 以42 %的产率得到三(2-羟乙基)甲基氢氧化铵
  参考文献：
  名称：

  WO2023/102167

  摘要：

  公开号：
• 作为试剂：
  描述：

  苯胺 、 alkaline earth salt of/the/ methylsulfuric acid 在 盐酸 、 三(2-羟乙基)甲基氢氧化铵 、 乙醇 、 sodium nitrite 作用下， 生成 N-(2,2-dimethyl-5-nitro-[1,3]dioxan-5-ylmethyl)-N-nitroso-aniline
  参考文献：
  名称：

  Malinowski; Urbanski, Roczniki Chemii, 1951, vol. 25, p. 183,196

  摘要：

  DOI：

文献信息

• NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION
  申请人：Lee Wai Mun

  公开号：US20090111965A1

  公开（公告）日：2009-04-30

  The present application relates to semiconductor processing compositions comprising at least one compound containing at least one amidoxime functional group and to methods of using these compositions in semiconductor processing. The present application also describes the preparation of amidoximes for a semiconductor processing composition by (a) mixing a cyanoethylation catalyst, a nucleophile and an alpha-unsaturated nitrile to produce a cyanoethylation product; and (b) converting a cyano group in the cyanoethylation product into an amidoxime functional group.

  本申请涉及包含至少一个含有至少一个酰胺肟功能团的化合物的半导体加工组合物，以及使用这些组合物进行半导体加工的方法。本申请还描述了通过(a)混合氰乙基化催化剂、亲核试剂和不饱和α腈以产生氰乙基化产品；(b)将氰乙基化产品中的氰基团转化为酰胺肟功能团来制备用于半导体加工组合物的酰胺肟的方法。
• Method for Producing Fluorine-Containing Cyclopropane Carboxylic Acid Compound
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20180186763A1

  公开（公告）日：2018-07-05

  The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing dial compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step). The fluorine-containing cyclopropane carboxylic acid compound, such as fluorine-containing cyclopropane monoester or its salt, can be obtained with high chemical and optical purity by mixing the fluorine-containing cyclopropane monoester with an amine and subjecting the resulting salt of the fluorine-containing cyclopropane monoester and amine to recrystallization purification.

  本发明提供了一种工业上可应用的生产含氟环丙烷羧酸化合物的方法，该化合物可用作制药和农药产品的中间体。通过以下步骤获得含氟环丙烷单酯：使用含氟二醇化合物和氟磺酰氟形成含氟环状硫酸酯（作为环状硫酸酯化步骤）；将含氟环状硫酸酯与丙二酸二酯反应，从而形成含氟环丙烷二酯（作为环丙烷化步骤）；并水解含氟环丙烷二酯（作为水解步骤）。通过将含氟环丙烷单酯与胺混合并将所得的含氟环丙烷单酯和胺的盐进行重结晶纯化，可以获得高化学和光学纯度的含氟环丙烷羧酸化合物，例如含氟环丙烷单酯或其盐。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• Positive photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20020172886A1

  公开（公告）日：2002-11-21

  A positive photoresist composition comprising the components of: (a) a resin which decomposes by the action of an acid, thereby having an increased solubility in an alkali developer; and (b) a compound which is represented by the formula (1) and generates an acid by exposure to active rays or radiation, and a compound which is represented by the formula (2) and generates an acid by exposure to active rays or radiation.

  一种正向光致变色胶组合物，包括以下组成部分：(a)一种树脂，通过酸的作用分解，从而在碱性显影剂中具有增加的溶解度；和(b)一种化合物，其由公式(1)表示，并通过暴露于活性光线或辐射而产生酸，以及一种由公式(2)表示的化合物，通过暴露于活性光线或辐射而产生酸。
• CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE
  申请人：Lee Wai Mun

  公开号：US20090130849A1

  公开（公告）日：2009-05-21

  A composition and associated method for chemical mechanical planarization (or other polishing) is described. The composition contains an amidoxime compound and water. The composition may also contain an abrasive and a compound with oxidation and reduction potential. The composition is useful for attaining improved removal rates for metal, including copper, barrier material, and dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications.

  本文描述了一种化学机械平整化（或其他抛光）的组合物及其相关方法。该组合物含有一种酰胺肟化合物和水。该组合物还可以含有磨料和具有氧化还原潜力的化合物。该组合物可用于在金属CMP中获得改进的金属去除速率，包括铜、屏障材料和金属CMP中的介电层材料。该组合物在金属CMP应用的相关方法中特别有用。