、 甲基丙烯酸缩水甘油酯 、 三乙胺 、 三(N-亚硝基-N-苯基羟胺)铝盐 以
N,N-二甲基甲酰胺 为溶剂,
以Further, 0.1 g of N-nitrosophenylhydroxylamine aluminum salt (Q-1301 (commercial name) produced by Wako Pure Chemical Industries, Ltd的产率得到
参考文献:
名称:
Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof
Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof
申请人:Okada Koji
公开号:US20060199920A1
公开(公告)日:2006-09-07
A photosensitive resin composition according to the present invention includes at least a base resin component (A) and a (meth)acryls compound (B), wherein the base resin component (A) is any one of: a polyimide resin (A-1) having at least either a hydroxyl group or a carboxyl group in its structure; a polyamide resin (A-2) having at least either a hydroxyl group or a carboxyl group in its structure; and photosensitive imide(meth)acrylsiloxaneoligomer (A-3). On this account, it is possible to realize characteristics such as (1) realization and improvement of water system developing property, (2) improvement of utility as an imidized film, (3) improvement of post-curing property, and (4) simplification of manufacture of a print wiring substrate. Thus, the photosensitive resin composition can be favorably used particularly in a photosensitive dry film resin, a laminate using the same, a print wiring substrate using the same, and the like.