三十九氟二十烷酸 | 68310-12-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 三十九氟二十烷酸
• 英文名称: perfluoroeicosanic acid
• 英文别名: Perfluoroeicosanoic acid；2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,14,14,15,15,16,16,17,17,18,18,19,19,20,20,20-nonatriacontafluoroicosanoic acid
• CAS: 68310-12-3
• 化学式: C₂₀HF₃₉O₂
• 分子量: 1014.16
• InChiKey: VLLYHFSAJNIONB-UHFFFAOYSA-N

物化性质

• 沸点：
  358.0±37.0 °C(Predicted)
• 密度：
  1.789±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  13
• 重原子数：
  61
• 可旋转键数：
  18
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.95
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  41

文献信息

• PROCESS FOR PRODUCING ESTER COMPOUND
  申请人：Imazeki Shigeaki

  公开号：US20100324314A1

  公开（公告）日：2010-12-23

  PROBLEM To provide an environmentally-friendly method for producing industrially an ester compound. SOLUTION The present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.

  问题提供一种生产工业酯化合物的环保方法。 解决方案是一种生产酯化合物的方法，包括将羧酸和醇经过脱水缩合反应，使用一种不挥发的酸催化剂，然后通过将弱碱性物质与残留的酸催化剂接触来去除残留的酸催化剂。
• Hybrid onium salt
  申请人：Ishihara Masami

  公开号：US20050020710A1

  公开（公告）日：2005-01-27

  The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: [wherein R 1 to R 3 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 1 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 1 is an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; and R 4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: (wherein R 5 to R 7 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 2 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 2 an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; A 3 is a counter anion; m is an integer of 0 to 4; and two ns are each independently an integer of 0 to 5); A 1 and A 2 are each independently a counter anion; and m and n are the same as described above], and a polymerization initiator or an acid generator, comprising said onium salt.

  本发明涉及一种杂化型离子盐，其分子中具有碘化离子盐和亚砜盐，例如，作为阳离子型光聚合引发剂和化学放大型抗蚀剂的酸发生剂有用，并提供由通式[1]所示的杂化型离子盐：[其中R1至R3分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q1是直链、氧原子、硫原子或较低的烷基链；T1是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；R4是烷基、烯丙基、芳基或芳基烷基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基或由通式[2]所示的基：（其中R5至R7分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q2是直链、氧原子、硫原子或较低的烷基链；T2是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；A3是一个对离子；m是0到4的整数；两个n各自独立地是0到5的整数）；A1和A2各自独立地是一个对离子；m和n与上述描述相同]，以及包含该离子盐的聚合引发剂或酸发生剂。
• Heterocycle-bearing onium salts
  申请人：Ishihara Masami

  公开号：US20050233253A1

  公开（公告）日：2005-10-20

  The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]: [wherein R is a group shown by the general formula [2]: (wherein R 3 and R 4 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 2 is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]: (wherein R 5 and R 6 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 3 and X 4 are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R 1 and R 2 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]: HM 1 (R 7 ) 4 [4] (wherein M 1 is a boron atom or a gallium atom; and R 7 is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]: [wherein R 26 and R 27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A 3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], and when only one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], A 3 is an anion derived from an inorganic strong acid shown by the general formula [36]; HM 3 F 6 [36] (wherein M 3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.

  本发明涉及一种含杂环离子盐，例如，用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂，并提供“一种由通式[1]所示的含杂环离子盐：[其中R是由通式[2]所示的基团：（其中R3和R4分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X2是氧原子或硫原子；i是0到4的整数；j是0到3的整数），或由通式[3]所示的基团：（其中R5和R6分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X3和X4分别独立地是氧原子或硫原子；p是0到2的整数；q是0到3的整数）；R1和R2分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；m和n分别独立地是0到5的整数；A是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子：HM1（R7）4[4]（其中M1是硼原子或镓原子；R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团）]”或“一种由通式[35]所示的含杂环离子盐：[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团，上述通式[2]所示的基团或上述通式[3]所示的基团；A3是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子；并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团，当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时，A3是从通式[36]所示的无机强酸得到的阴离子：HM3F6[36]（其中M3是磷原子、砷原子或锑原子），有机酸或由通式[4]所示的化合物]”。
• Sulfonium salt compounds
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1113005A1

  公开（公告）日：2001-07-04

  A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R1 and R2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R1 and R2 are a lower alkyl group, R3s are each independently an alkyl group, n is an integer of 0 to 3, i is an integer of 1 to 3, j is an integer of 0 to 2, provided that i+j=3, Y- is an anion derived from a sulfonic acid shown by the general formula [2]         R4―SO3H     [2] [wherein R4 is an alkyl group or an aryl group which may have as a substituent an alkyl group]). (wherein X is a phenyl group which has a substituent at an ortho- and/or a meta-position, m is an integer of 1 to 3, q is an integer of 0 to 2, provided that m+q=3, p is 1 or 2 and Zp- is an anion derived from a carboxylic acid).

  通式[1]或[3]所示的三苯基锍盐化合物。 (其中，R1 和 R2 各自独立地为氢原子或低级烷基，条件是 R1 和 R2 中至少有一个是低级烷基；R3s 各自独立地为烷基；n 为 0 至 3 的整数；i 为 1 至 3 的整数；j 为 0 至 2 的整数，条件是 i+j=3 ；Y- 是由通式[2]所示磺酸衍生的阴离子。 R4-SO3H [2] [其中 R4 为烷基或芳基，其取代基可为烷基]）。 (其中 X 是在正位和/或偏位上具有取代基的苯基，m 是 1 至 3 的整数，q 是 0 至 2 的整数，条件是 m+q=3，p 是 1 或 2，Zp- 是衍生自羧酸的阴离子）。
• CLEANING AGENT FOR THERMOSTATIC CHAMBERS
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1865049A1

  公开（公告）日：2007-12-12

  [PROBLEMS] The present invention provides a novel cleaner having bacteria-proof, fungi-proof and algae-proof effects, which is added to a reaction thermostat using water as medium in scientific apparatus, particularly a thermostatic water bath in an automatic analyzer. [SOUTLIN] A cleaner for a thermostatic water bath, which comprises a quaternary ammonium salt as shown by the general formula [1] described below and/or a preservative agent having amphoteric surface activity, and a surface active agent, wherein R1 to R4 independently represent an alkyl group, provided that at least one among R1 to R4 is an alkyl group having 8 to 18 carbon atoms, and at least one among them is a lower alkyl group having 1 to 3 carbon atoms; and X- represents an anion derived from a carboxylic acid having two or more carbon atoms; and a cleaning method of a thermostatic water bath, wherein the cleaner is added to a thermostatic water bath.

  问题 本发明提供了一种具有防菌、防霉、防藻效果的新型清洁剂，该清洁剂被添加到以水为介质的反应恒温器中，用于科学仪器，特别是自动分析仪中的恒温水浴。 [苏特琳］ 一种用于恒温水浴的清洁剂，它由下述通式[1]所示的季铵盐和/或具有两性表面活性的防腐剂以及表面活性剂组成、 其中 R1 至 R4 独立地代表烷基，条件是 R1 至 R4 中至少有一个是具有 8 至 18 个碳原子的烷基，且其中至少有一个是具有 1 至 3 个碳原子的低级烷基；X- 代表从具有两个或两个以上碳原子的羧酸衍生的阴离子；以及一种恒温水浴的清洁方法，其中该清洁剂被添加到恒温水浴中。