perfluoro-o-toluyl fluoride

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: perfluoro-o-toluyl fluoride
• 英文别名: 3,4,5,6-tetrafluoro-2-trifluoromethylbenzoyl fluoride；2,3,4,5-Tetrafluoro-6-(trifluoromethyl)benzoyl fluoride
• 化学式: C₈F₈O
• 分子量: 264.075
• InChiKey: BAMNTOWFZZVYDW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  1,1,3,3,4,5,6,7-八氟-1,3-二氢异苯并呋喃 在 氢氟酸 作用下， 反应 10.0h， 以50%的产率得到perfluoro-o-toluyl fluoride
  参考文献：
  名称：

  在邻苯二甲酸与四氟化硫反应中形成1,1,3,3-四氟-1,3-二氢异苯并呋喃。评估取代基的空间和电子效应

  摘要：

  使4,5-二硝基邻苯二甲酸和3,6-二甲基邻苯二甲酸酐与四氟化硫反应，以5的比例生成相应的双（三氟甲基）苯与1,1,3,3-四氟-1,3-二氢异苯并呋喃的混合物：比例分别为1和1：3.6。比较了四氟化硫与取代和未取代的邻苯二甲酸和均苯四酸反应的这些和较早的结果，并讨论了影响循环和非环状产物竞争形成的酸中的结构因素。还研究了1,1,3,3-四氟-1,3-二氢异苯并呋喃对无水氟化氢裂解的稳定性。

  DOI：

  10.1016/s0022-1139(00)80485-6

文献信息

• Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications
  申请人：Ji Bing

  公开号：US20050011859A1

  公开（公告）日：2005-01-20

  A mixture and a method comprising same for etching a dielectric material from a layered substrate are disclosed herein. Specifically, in one embodiment, there is provided a mixture for etching a dielectric material in a layered substrate comprising an unsaturated oxygenated fluorocarbon. The mixture of the present invention may be contacted with a layered substrate comprising a dielectric material under conditions sufficient to at least partially react with and remove at least a portion of the dielectric material. In another embodiment of the present invention, there is provided a method for making an unsaturated oxygenated fluorocarbon.

  本文公开了一种用于从分层基板中蚀刻介电材料的混合物和方法。具体来说，在一种实施例中，本发明提供了一种用于蚀刻分层基板中介电材料的混合物，其中包括不饱和含氧氟碳化合物。本发明的混合物可以与包含介电材料的分层基板接触，在足够的条件下至少部分反应并去除至少一部分介电材料。在本发明的另一种实施例中，提供了一种制备不饱和含氧氟碳化合物的方法。
• Unsaturated oxygenated fluorocarbons for selective anisotropic etch applications
  申请人：AIR PRODUCTS AND CHEMICALS, INC.

  公开号：EP1498941A2

  公开（公告）日：2005-01-19

  A mixture and a method comprising same for etching a dielectric material from a layered substrate are disclosed herein. Specifically, in one embodiment, there is provided a mixture for etching a dielectric material in a layered substrate comprising an unsaturated oxygenated fluorocarbon. The mixture of the present invention may be contacted with a layered substrate comprising a dielectric material under conditions sufficient to at least partially react with and remove at least a portion of the dielectric material. In another embodiment of the present invention, there is provided a method for making an unsaturated oxygenated fluorocarbon.

  本文公开了一种用于蚀刻层状基底中的介电材料的混合物和包含该混合物的方法。具体来说，在一个实施方案中，提供了一种用于蚀刻层状基底中的介电材料的混合物，该基底由不饱和含氧碳氟化合物组成。本发明的混合物可在足以至少部分与介电材料反应并去除至少部分介电材料的条件下与包含介电材料的分层基底接触。在本发明的另一个实施方案中，提供了一种制造不饱和含氧碳氟化合物的方法。
• Reactions of tetrafluorophthalic and difluoropyromellitic acids with sulphur tetrafluoride
  作者：Wojciech Dmowski

  DOI：10.1016/s0022-1139(00)80039-1

  日期：1993.2

  Fluorination of tetrafluorophthalic acid (1) with an SF4/HF mixture at 190-300-degrees-C afforded, beside the expected perfluoro-o-xylene (2) and perfluoro-o-toluyl fluoride (4), considerable amounts of octafluoro-1,3-dihydroisobenzofuran (3). The reaction with difluoropyromellitic acid (5) at 190-degrees-C gave a mixture of perfluoro-2,4,5-trimethylbenzoyl fluoride (9), perfluoro-2,5-dimethylterephthaloyl difluoride (10a), perfluoro-2,4-dimethylisophthaloyl difluoride (10b) and perfluoro-5-methyl-6-fluoroformyl-1,3-dihydroisobenzofuran (11), but at 300-degrees-C perfluorodurene (6), perfluoro-5,6-dimethyl-1,3-dihydroisobenzofuran (7) and perfluoro-2,4,5-trimethylbenzoyl fluoride (9) were obtained in a 3:1:0.8 ratio.
• Formation of 1,1,3,3-tetrafluoro-1,3-dihydroisobenzofurans in reactions of phthalic acids with sulphur tetrafluoride. Evaluation of the steric and electronic effects of the substituents
  作者：Wojciech Dmowski

  DOI：10.1016/s0022-1139(00)80485-6

  日期：1993.11

  acid and 3,6-dimethylphthalic anhydride have been reacted with sulphur tetrafluoride to give mixtures of the corresponding bis(trifluoromethyl)benzenes and 1,1,3,3-tetrafluoro-1,3-dihydroisobenzofurans in a 5:1 and 1:3.6 ratio, respectively. These and earlier results on the reactions of sulphur tetrafluoride with substituted and unsubstituted phthalic and pyromellitic acids are compared and structural

  使4,5-二硝基邻苯二甲酸和3,6-二甲基邻苯二甲酸酐与四氟化硫反应，以5的比例生成相应的双（三氟甲基）苯与1,1,3,3-四氟-1,3-二氢异苯并呋喃的混合物：比例分别为1和1：3.6。比较了四氟化硫与取代和未取代的邻苯二甲酸和均苯四酸反应的这些和较早的结果，并讨论了影响循环和非环状产物竞争形成的酸中的结构因素。还研究了1,1,3,3-四氟-1,3-二氢异苯并呋喃对无水氟化氢裂解的稳定性。