申请人:DSM IP Assets B.V.
公开号:EP1972620A1
公开(公告)日:2008-09-24
Process for the manufacture of a compound of the structure
with
R1= hydrogen, alkyl (C1 - C10, linear, cyclic or branched, aliphatic or aromatic), NR'R'' (wherein R' and R'' are independently selected from H, alkyl [C1 - C10, linear, cyclic or branched, aliphatic or aromatic] and
R2= CH2R3 wherein R3 is selected from NHR''' (with R'' = C(O)H, C(O)CH3, C(O)alkyl, CH2C6H2(OMe)3 or other saponifiable residues), alkyl (C1 - C10, linear, cyclic or branched) aromatic residues, heteroaryl residues, substituted aryl residues, e.g. 3,4,5-trimethoxy-phenyl).
wherein 1 equivalent of an α-formyl-propionitrile salt is reacted with 0.75 to 2 equivalents of an acetamidine salt in the presence of a Lewis acid.
结构化合物的制造工艺
其中
R1= 氢、烷基(C1 - C10,直链、环状或支链,脂肪族或芳香族)、NR''R''(其中 R' 和 R''独立选自 H、烷基 [C1 - C10,直链、环状或支链,脂肪族或芳香族] 以及
R2=CH2R3,其中 R3 选自 NHR'''(R''=C(O)H、C(O)CH3、C(O)烷基、CH2C6H2(OMe)3 或其他可皂化残基)、烷基(C1 - C10,直链、环状或支链)芳香残基、杂芳基残基、取代芳基残基,例如 3,4,5-三甲氧基苯基)。
其中 1 个当量的 α-甲酰基丙腈盐在路易斯酸存在下与 0.75 至 2 个当量的乙脒盐反应。