Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist
申请人:Hatakeyama Naoyoshi
公开号:US20080009647A1
公开(公告)日:2008-01-10
The invention provides a novel adamantane derivative useful as a monomer for producing functional resins such as photosensitive resins particularly for use in lithography, and a method for producing the derivative. The adamantane derivative has a structure represented by formula (I-a) and the method for producing the adamantane derivative employs a corresponding adamantane derivative serving as a starting material. In formula (I), R
1
represents H, CH
3
, or CF
3
; R
2a
represents a C1 to C30 alkyl group or a hydrocarbon group containing a C3 to C30 cycloalkyl group or a C6 to C30 aryl group, the alkyl group or the hydrocarbon group having a hetero atom; each of X
1
and X
2
represents O or S; Y represents a C1 to C10 alkyl group, a halogen atom, OH, or SH, or two Ys are linked to form ═O or ═S; k represents an integer of 0 to 14; and each of m and n is an integer of 0 to 2.