申请人:AZ Electronic Materials (Luxembourg) S.à.r.l.
公开号:EP3061792A1
公开(公告)日:2016-08-31
A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: R1nSi(X)4-n (wherein R1 represents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein R2 to R7 independently represent an alkyl group or the like; M1 and M2 independently represent an arylene group, an alkylene group or the like; and Y1 to Y6 independently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film. When the composition is coated onto a substrate, is then heated or exposed to light, is then developed if necessary, and is then heated and cured at a low temperature, a cured film can be formed.
一种热固化或光固化组合物,其中包括:一种聚硅氧烷,它是由式(i)代表的硅化合物与式:R1nSi(X)4-n(其中 R1 代表烷基、芳基或类似基团;X 代表氯原子或烷 氧基团;n 代表 0 至 2)与式(b)或(c)代表的硅化合物(ii)(其中 R2 至 R7 独立地代表烷基或类似基团;M1 和 M2 独立地代表芳基、亚烷基或类似基团;Y1 至 Y6 独立地代表氯原子或烷氧基团),在碱催化剂或酸催化剂、聚合引发剂(可在热或光的作用下生成酸或碱)和溶剂的存在下进行。这种组合物可以形成厚膜。将该组合物涂在基底上,然后加热或曝光,必要时显影,然后在低温下加热和固化,即可形成固化膜。