二甲基甲硅烷基 | 24669-76-9

• 分子结构分类: 有机化合物 - 碳氢化合物衍生物
• 中文名称: 二甲基甲硅烷基
• 英文名称: dimethylsilyl radical
• 英文别名: dimethylsilyl；dimethylsilanyl；Dimethylsilyl-Radikal；Dimethylsilan-Rad.
• CAS: 24669-76-9
• 化学式: C₂H₇Si
• 分子量: 59.1631
• InChiKey: XJJXHGYDIHDBQE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.52
• 重原子数：
  3
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  二甲基硅烷 在 O 作用下， 29.9 ℃ 、399.99 Pa 条件下， 生成 二甲基甲硅烷基
  参考文献：
  名称：

  氧原子（3P）与硅烷，甲基硅烷，二甲基硅烷和三甲基硅烷反应的动力学和机理

  摘要：

  The reactions of O(3P) atoms with the silanes Me(4-n)SiH(n) (n = 1-4) have been investigated at room temperature in a discharge flow system with mass spectrometric detection and also in stationary photolysis experiments. Analysis of the end products provided conclusive evidence that the only primary process occurring in each case was the abstraction of hydrogen from the Si-H bond by the O atom leading to the formation of the OH and silyl radicals. The values of the rate constants obtained are k/10(-13) cm3 s-1): k(O + SiH4) = 3.5, k(O + SiD4) = 1.4, k(O + MeSiH3) = 8.9; k(O + Me2SiH2) = 18.0 k(O + Me3SiH) = 30.6, and k(O + Me3SiD) = 16.0. The marked increase in rate constant with methylation is unexpected in view of the known similarity of the Si-H bond dissociation energy in SiH4 and the methylsilanes. A possible explanation is offered in terms of a reaction model involving partial charge transfer from Si to the attacking O, followed by proton transfer.

  DOI：

  10.1021/j100164a042

文献信息

• Kinetic studies and ab initio investigations of the reactions of atomic bromine with methylsilane and dimethylsilane
  作者：Luying Ding、Paul Marshall

  DOI：10.1039/ft9938900419

  日期：——

  ca.±13%. Assumed activation energies for the reverse reactions yield Si—H bond dissociation enthalpies, D298, of 388 ± 5 and 392 ± 5 kJ mol–1 in methylsilane and dimethylsilane, respectively. These values and the Arrhenius parameters are intermediate between earlier results for Br + SiH4 and Br +(CH3)3SiH, although the uncertainty in D298 is too great to establish a firm trend in D298 with the degree

  Br [4p（2 P J）]与CH 3 SiH 3（1）和（CH 3）2 SiH 2（2）的反应动力学已使用快速光解/时间分辨原子共振光谱在整个温度下进行了测量。范围分别为350–550和390–550K。结果为k 1 =（4.0±0.5）×10 –10 exp（–19.7±0.5 kJ mol –1 / RT）和k 2 =（4.3±0.8）×10 –10 exp（–21.6±0.7 kJ mol – 1 / RT）以cm 3 s –1为单位，置信限为。±13％。假定逆反应的活化能在甲基硅烷和二甲基硅烷中分别产生388±5和392±5 kJ mol –1的Si-H键解离焓D 298。这些值和阿仑尼乌斯参数是BR +的SiH先前的结果之间的中间4和Br +（CH 3）3的SiH，尽管在不确定性d 298太大以建立牢固的趋势d 298与甲基化程度。硅烷和相应的甲硅烷基自由基通过从头开始的方法表征为最高MP4
• Kinetics and mechanism of the reactions of oxygen atoms (3P) with silane, methylsilane, dimethylsilane, and trimethylsilane
  作者：O. Horie、R. Taege、B. Reimann、N. L. Arthur、P. Potzinger

  DOI：10.1021/j100164a042

  日期：1991.5

  The reactions of O(3P) atoms with the silanes Me(4-n)SiH(n) (n = 1-4) have been investigated at room temperature in a discharge flow system with mass spectrometric detection and also in stationary photolysis experiments. Analysis of the end products provided conclusive evidence that the only primary process occurring in each case was the abstraction of hydrogen from the Si-H bond by the O atom leading to the formation of the OH and silyl radicals. The values of the rate constants obtained are k/10(-13) cm3 s-1): k(O + SiH4) = 3.5, k(O + SiD4) = 1.4, k(O + MeSiH3) = 8.9; k(O + Me2SiH2) = 18.0 k(O + Me3SiH) = 30.6, and k(O + Me3SiD) = 16.0. The marked increase in rate constant with methylation is unexpected in view of the known similarity of the Si-H bond dissociation energy in SiH4 and the methylsilanes. A possible explanation is offered in terms of a reaction model involving partial charge transfer from Si to the attacking O, followed by proton transfer.