Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.
本发明提供了一种光刻胶和一种光刻胶用化合物,在不破坏
化学放大光刻胶的基本特性(如图案形状、耐干蚀性、耐热性等)的情况下,以良好的平衡提高了光刻胶的灵敏度、分辨率和线边缘粗糙度(LER)。本发明提供了一种生产通式(1)表示的脂环族酯化合物的方法、一种通式(1)表示的脂环族酯化合物、一种由脂环族酯化合物聚合得到的(甲基)
丙烯酸共聚物以及一种含有该(甲基)
丙烯酸共聚物的感光
树脂组合物。生产通式(1)表示的脂环酯化合物的方法包括将通式(2)表示的
金刚烷化合物与通式(3)表示的羟基烷基胺反应生成通式(4)表示的
金刚烷酰胺化合物,然后将通式(4)表示的
金刚烷酰胺化合物与(甲基)
丙烯酸反应。