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十五烷酸铵 | 93917-76-1

中文名称
十五烷酸铵
中文别名
——
英文名称
Azane;pentadecanoic acid
英文别名
——
十五烷酸铵化学式
CAS
93917-76-1
化学式
C15H33NO2
mdl
——
分子量
259.43
InChiKey
FRYMZTAOBLUQBK-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.2
  • 重原子数:
    18
  • 可旋转键数:
    12
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.93
  • 拓扑面积:
    41.1
  • 氢给体数:
    1
  • 氢受体数:
    2

安全信息

  • 海关编码:
    2923900090

文献信息

  • Aqueous pigment dispersions
    申请人:LANDA LABS (2012) LTD.
    公开号:US11479687B2
    公开(公告)日:2022-10-25
    There are disclosed aqueous pigment dispersions containing dispersant-improving-agents, and methods of preparing and using the same.
    本文公开了含有分散剂改进剂的颜料分散体及其制备和使用方法。
  • IMPROVED AQUEOUS PIGMENT DISPERSIONS
    申请人:Landa Labs (2012) Ltd.
    公开号:EP3464489A1
    公开(公告)日:2019-04-10
  • Photosensitive composition and method for forming pattern using the same
    申请人:Kodama Kunihiko
    公开号:US20050287473A1
    公开(公告)日:2005-12-29
    A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.
  • POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME
    申请人:FUJIFILM Corporation
    公开号:US20160187780A1
    公开(公告)日:2016-06-30
    A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
  • US7371505B2
    申请人:——
    公开号:US7371505B2
    公开(公告)日:2008-05-13
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