Methyl 2-pyrrolidin-1-ylbutanoate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Methyl 2-pyrrolidin-1-ylbutanoate
• 化学式: C₉H₁₇NO₂
• mdl: MFCD13881937
• 分子量: 171.24
• InChiKey: CTMBTXLXNVKFDU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  12
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.888
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20050079446A1

  公开（公告）日：2005-04-14

  The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.

  本发明提供了一种聚合物，它至少具有由以下通式 (1a) 表示的重复单元、由以下通式 (2a) 表示的重复单元和由以下通式 (3b) 表示的重复单元以及由以下通式 (1c) 表示的重复单元中的一个或多个，以及一种含有该聚合物作为基树脂的正抗蚀剂组合物。因此，可以提供一种在高能量光束下曝光时具有高灵敏度和高分辨率的正抗蚀剂组合物，由于抑制了显影时的膨胀，因此线边缘粗糙度小，显影后的残留物少。
• Novel polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20050079440A1

  公开（公告）日：2005-04-14

  There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin. There can be provided a positive resist composition having high sensitivity and high resolution on exposure to a high energy beam, wherein line edge roughness is reduced since swelling at the time of development is suppressed, and the residue after development is little.