申请人:SAGAMI CHEMICAL RESEARCH CENTER
公开号:EP0335390A2
公开(公告)日:1989-10-04
Cephalosporin compounds represented by the general formula
in which R¹ is a hydrogen atom or a protective group for the amino group,
R² is a hydrogen atom or a protective group for the hydroxyl group,
R³ is a hydrogen atom, a self-forming cation or a protective group for the carboxyl group, and
R⁴ is a hydrogen atom, a halogen atom or a lower alkyl group,
and their pharmacologically acceptable salts, process for their production and use of the same compounds as medicaments, particularly as antibiotic agents.
由通式表示的头孢菌素化合物
其中 R¹ 是氢原子或氨基的保护基团、
R²是氢原子或羟基的保护基团
R³ 是氢原子、自成阳离子或羧基的保护基团,以及
R⁴ 是氢原子、卤素原子或低级烷基、
及其药理学上可接受的盐、其生产工艺以及相同化合物作为药物,特别是作为抗生素制剂的用途。